PXRD before/after electrode fabrication and bulk electrolysis
MoSx-SIM-NDC-SALI/FTO electrode · Electrode
Rigaku ATX-G, 2theta = 0.05 degree step, 2 degrees/min over 2-20 degrees at 50 kV and 240 mA; film washed before after-catalysis PXRD
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| crystalline framework retention | PXRD patterns confirm retention of crystalline framework during NDC installation, MoOx deposition, sulfidation, electrode fabrication and after bulk electrolysis | — | — | Text Qualitative | 513 · Redox Mediator-Assisted Electrocatalysis · Figure S6 |