cMOF Evidence Base

Synthesis evidence

Sensitive humidity sensors based on ionically conductive metal-organic frameworks for breath monitoring and non-contact sensing

Zhang S., Li L., Lu Y. et al. · Applied Materials Today · 2022 · 101391

9 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Both

Route 1: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsCo(NO3)2*6H2O in deionized water, 1 mM
Linker precursorsH4dobdc in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcecobalt (II) nitrate trihydrate Co(NO3)2*6H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
LinkerH4dobdc0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Partial recipeSource: Both

Route 2: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsCu(NO3)2*3H2O in deionized water, 1 mM
Linker precursorsH4dobdc in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcecopper (II) nitrate trihydrate Cu(NO3)2*3H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
LinkerH4dobdc0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Vague recipeSource: Main

Route 3: Other

main p.7, article p.7 · Results and discussion · Fig. 6a-b

Metal precursorsMg2(dobdc)-based IC-MOF film; detailed precursor use not separately reported for flexible device
Linker precursorsH4dobdc implied from Mg2(dobdc)-based IC-MOF; not separately specified for flexible device
Substrate orientationPolyethylene naphthalate (PEN) film flexible substrate
Blocked Missing Si recipeSource: Missing SI

Route 4: Unknown

main p.3, article p.3 · Results and discussion · Fig. 2c

Metal precursorsnot extractable from provided SI text
Linker precursorsnot extractable from provided SI text
Partial recipeSource: Both

Route 5: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsMg(NO3)2*6H2O in deionized water, 1 mM
Linker precursorsH4dobdc in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Scalability contextAuthors describe the method as handy and based on continuous spraying, but no scale or yield is reported.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcemagnesium (II) nitrate trihydrate Mg(NO3)2*6H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Linker1,4-dioxido-2,5-benzenedicarboxylate (H4dobdc)0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
SolventmethanolNot specifiedmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Solventdeionized waterNot specifiedmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Partial recipeSource: Both

Route 6: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsMg(NO3)2*6H2O in deionized water, 1 mM
Linker precursorsH4PMA in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcemagnesium (II) nitrate trihydrate Mg(NO3)2*6H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Linkerpyromellitic acid (H4PMA)0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Partial recipeSource: Both

Route 7: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsMg(NO3)2*6H2O in deionized water, 1 mM
Linker precursorsH4PTA in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcemagnesium (II) nitrate trihydrate Mg(NO3)2*6H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Linkerterephthalic acid (H4PTA)0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Partial recipeSource: Both

Route 8: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsNi(NO3)2*6H2O in deionized water, 1 mM
Linker precursorsH4dobdc in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcenickel (II) nitrate trihydrate Ni(NO3)2*6H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
LinkerH4dobdc0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
Partial recipeSource: Both

Route 9: Liquid Liquid Interface

main p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2

Metal precursorsZn(NO3)2*6H2O in deionized water, 1 mM
Linker precursorsH4dobdc in methanol, 0.2 mM
SolventsMethanol; deionized water
Atmospherenot reported
Substrate orientationITO/conductive glass substrate; SI Figure S2 shows ITO glass plasma-treated before contact with M(NO3)2 aqueous phase and final MOF layer on the substrate.
Work-upRemaining reaction solution removed with a syringe; free-standing MOF layer deposited on conductive glass/ITO and dried according to SI Figure S2.
ActivationDrying shown schematically in SI Figure S2; no thermal/vacuum activation conditions reported.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
Metal Sourcezinc (II) nitrate trihydrate Zn(NO3)2*6H2O1 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2
LinkerH4dobdc0.2 mMmain p.2, article p.2 · 2.2. Fabrication of IC-MOFs · Section 2.2; Figure S2