Reported material

Ni3(HIR3-TAT)2 conductive MOF series

This group combines only harmless case, dash and spacing variants of the reported identity. It does not assert a broader chemical equivalence without source review.

1primary papers
1material records
2linked samples
4linked measurements
4linked results
2024–2024publication span

Evidence coverage

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Primary papers

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1 papers

Per-paper identity records

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Show 1 material identity record
Paper and reported nameFormula and componentsStructure contextSource
Ni3(HIR3-TAT)2 conductive MOF series2024 · Electrochemical Capacitance Traces with Interlayer Spacing in Two-dimensional Conductive Metal–Organic FrameworksNi3(HIR3-TAT)2; R = H, Et, n-Bu, n-PentNi centres from nickel acetate. · N-functionalized hexaaminotriazatruxene / HIR3-TAT ligands.2D · PristineHATAT-based hexagonal 2D layered conductive MOF family with alkyl substituents controlling interlayer spacing and pore occupancy.2 · Results · Figure 1