Synthesis · Two isostructural linear coordination polymers: The size of the metal ion impacts the electrical conductivity

4 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Main

Route 1: Other

2 · Device fabrication and characterization

Metal precursorsas-synthesised compound 2

SolventsN,N-dimethylformamide (DMF)

Atmosphereambient for spin coating; vacuum oven drying; Al deposition at 10^-6 Torr

Temperature100 for vacuum oven drying

Timespin coating: 4 min at 800 rpm then 6 min at 1200 rpm; drying several minutes

Substrate orientationprecleaned ITO-coated glass; Al top electrode through shadow mask

Work-upVacuum oven dried to evaporate solvent; aluminium electrode deposited.

Activationvacuum oven at 100 deg C for several minutes

Scalability contextThin-film device fabrication only; effective device area 7.065 x 10^-2 cm2.

Show 4 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	compound 2	40 mg mL-1 in DMF	2 · Device fabrication and characterization
Solvent	N,N-dimethylformamide (DMF)	Not specified	2 · Device fabrication and characterization
Other	ITO-coated glass	Not specified	2 · Device fabrication and characterization
Other	Al electrode	Not specified	2 · Device fabrication and characterization

Partial recipeSource: Main

Route 2: Liquid Liquid Interface

2 · Synthesis of the compounds

Metal precursorsCd(NO3)2.4H2O (0.062 g, 0.2 mmol)

Linker precursorsSame as compound 1: 4-spy (0.036 g, 0.2 mmol); H2adc (0.023 g, 0.2 mmol)

SolventsSame layered MeOH/H2O/EtOH procedure as compound 1

AdditivesEt3N (0.021 g, 0.2 mmol), as in route for compound 1

Atmosphereambient/not specified

Temperatureroom temperature/not specified

Timea few days

Work-upColourless prism crystals isolated; detailed washing/drying not reported in main text.

Activationnot reported

Scalability contextLayering route gives 0.088 g, 70% yield; no scale-up information.

Show 5 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	Cd(NO3)2.4H2O	0.062 g, 0.2 mmol	2 · Synthesis of the compounds
Linker	4-spy	same as compound 1: 0.036 g, 0.2 mmol	2 · Synthesis of the compounds
Linker	H2adc	same as compound 1: 0.023 g, 0.2 mmol	2 · Synthesis of the compounds
Base	Et3N	same as compound 1: 0.021 g, 0.2 mmol	2 · Synthesis of the compounds
Solvent	MeOH/H2O/EtOH	same as compound 1	2 · Synthesis of the compounds

Partial recipeSource: Main

Route 3: Other

2 · Device fabrication and characterization

Metal precursorsas-synthesised compound 1

SolventsN,N-dimethylformamide (DMF)

Atmosphereambient for spin coating; vacuum oven drying; Al deposition at 10^-6 Torr

Temperature100 for vacuum oven drying

Timespin coating: 4 min at 800 rpm then 6 min at 1200 rpm; drying several minutes

Substrate orientationprecleaned ITO-coated glass; Al top electrode through shadow mask

Work-upVacuum oven dried to evaporate solvent; aluminium electrode deposited.

Activationvacuum oven at 100 deg C for several minutes

Scalability contextThin-film device fabrication only; effective device area 7.065 x 10^-2 cm2.

Show 4 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	compound 1	40 mg mL-1 in DMF	2 · Device fabrication and characterization
Solvent	N,N-dimethylformamide (DMF)	Not specified	2 · Device fabrication and characterization
Other	ITO-coated glass	Not specified	2 · Device fabrication and characterization
Other	Al electrode	Not specified	2 · Device fabrication and characterization

Partial recipeSource: Main

Route 4: Liquid Liquid Interface

2 · Synthesis of the compounds

Metal precursorsZn(NO3)2.6H2O (text/OCR gives Zn(NO)3.6H2O), 0.06 g, 0.2 mmol

Linker precursors4-spy (0.036 g, 0.2 mmol); H2adc (0.023 g, 0.2 mmol)

SolventsMeOH 2 mL; H2O 2 mL; 2 mL 1:1 v/v MeOH/H2O buffer solution; EtOH 2 mL

AdditivesEt3N (0.021 g, 0.2 mmol) used to neutralise H2adc

Atmosphereambient/not specified

Temperatureroom temperature/not specified

Time72

Work-upColourless prism crystals isolated; detailed washing/drying not reported in main text.

Activationnot reported

Scalability contextLayering route gives 0.074 g, 65% yield; no scale-up information.

Show 7 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	Zn(NO3)2.6H2O / OCR: Zn(NO)3.6H2O	0.06 g, 0.2 mmol	2 · Synthesis of the compounds
Linker	4-spy	0.036 g, 0.2 mmol	2 · Synthesis of the compounds
Linker	H2adc	0.023 g, 0.2 mmol	2 · Synthesis of the compounds
Base	Et3N	0.021 g, 0.2 mmol	2 · Synthesis of the compounds
Solvent	MeOH	2 mL plus MeOH/H2O buffer	2 · Synthesis of the compounds
Solvent	H2O	2 mL plus MeOH/H2O buffer	2 · Synthesis of the compounds
Solvent	EtOH	2 mL	2 · Synthesis of the compounds