Complete recipeSource: Main
Route 1: Other
17658 · Experimental Section, Schottky Device and I-V Measurements
SolventsN,N-dimethylformamide (DMF)
Atmosphereambient for I-V; vacuum drying and Al evaporation
Temperaturenormal temperature for measurement; deposition temperature not stated
Timesubstrate ultrasonication 20 min; spin coating 1 min per cycle, four cycles
Substrate orientationITO-coated glass
Work-upITO cleaned with 2-propanol, acetone and water; film dried under vacuum; Al electrode thermally evaporated at 10^-6 Torr through shadow mask
Activationvacuum drying after spin coating
Scalability contextSpin-coated device film thickness reported as 1 um.
Show 4 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | as-synthesized compound 1 | not stated | 17658 · Experimental Section, Schottky Device and I-V Measurements |
| Solvent | N,N-dimethylformamide (DMF) | not stated | 17658 · Experimental Section, Schottky Device and I-V Measurements |
| Other | ITO-coated glass substrate | Not specified | 17658 · Experimental Section, Schottky Device and I-V Measurements |
| Other | Al electrode | thermally evaporated at 10^-6 Torr | 17658 · Experimental Section, Schottky Device and I-V Measurements |