Partial recipeSource: SI
Route 1: Other
p020 / SI page 20 · Device Fabrication
Solventsacetone; ethanol; distilled water; DMF
AtmosphereN2 drying atmosphere; vacuum deposition at 10-6 Torr
Temperatureroom temperature
Substrate orientationITO-coated glass substrate
Work-upITO glass ultrasonically cleaned with acetone, ethanol and distilled water; dried under N2; compound 1 dispersed/dissolved in DMF and ultrasonicated; spin-coated on ITO; Al deposited by electron-beam vacuum coating using a shadow mask.
Scalability contextEffective diode area 7.065 x 10-6 m2; film thickness 1 micrometre. Spin speed/time and precursor concentration are not reported.
Show 7 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | compound 1 | Not specified | p020 / SI page 20 · Device Fabrication |
| Solvent | DMF | Not specified | p020 / SI page 20 · Device Fabrication |
| Solvent | acetone | substrate cleaning | p020 / SI page 20 · Device Fabrication |
| Solvent | ethanol | substrate cleaning | p020 / SI page 20 · Device Fabrication |
| Solvent | distilled water | substrate cleaning | p020 / SI page 20 · Device Fabrication |
| Other | ITO-coated glass substrate | Not specified | p020 / SI page 20 · Device Fabrication |
| Other | aluminium | top contact deposited by electron beam | p020 / SI page 20 · Device Fabrication |