Partial recipeSource: Main
Route 1: Other
7527 · Device fabrication
SolventsN,N-dimethylformamide (DMF)
AtmosphereAl electrode deposited under 10^-6 Torr
Time2 h ultrasonication; 2 min spin coating
Substrate orientationITO-coated glass substrate
Work-upITO glass cleaned sequentially with 2-propanol, acetone and distilled water; CP 1/DMF dispersion spin-coated at 1000 rpm for 2 min; film vacuum dried; Al electrode vacuum deposited.
Activationvacuum oven drying; temperature and time not reported
Scalability contextSpin-coated thin-film device fabrication; dispersion concentration and drying conditions not reported.
Show 4 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | as-synthesized CP 1 | Not specified | 7527 · Device fabrication |
| Solvent | N,N-dimethylformamide (DMF) | Not specified | 7527 · Device fabrication |
| Other | ITO-coated glass substrate | Not specified | 7527 · Device fabrication |
| Other | Al electrode | Not specified | 7527 · Device fabrication |