Complete recipeSource: Both
Route 1: Other
2118 · Methods - SURMOF Synthesis and IL Loading
Metal precursorsPreformed HKUST-1 SURMOF
SolventsAcetonitrile
AtmospherePure nitrogen flow drying after loading
Temperature25
Time0.333
Substrate orientationHKUST-1 SURMOF on interdigitated gold electrode substrate
Work-upRinsed with acetonitrile for 2 s to remove IL from the outer sample surface; dried in pure nitrogen flow.
ActivationNitrogen drying removes volatile acetonitrile from pores; IL remains because of vanishing vapour pressure.
Scalability contextPore loading tuned by IL/acetonitrile ratios of 0, 5, 15, 32, 50, 65, 80, 95 and 100%.
Show 3 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Electrolyte | [BMIM][NTf2] | IL/acetonitrile ratios of 0, 5, 15, 32, 50, 65, 80, 95, and 100% | 2118 · Methods - SURMOF Synthesis and IL Loading |
| Solvent | acetonitrile | immersion solvent and 2 s rinse solvent | 2118 · Methods - SURMOF Synthesis and IL Loading |
| Other | pure nitrogen | drying gas flow | 2118 · Methods - SURMOF Synthesis and IL Loading |