Synthesis · A multifunctional n-doped cu–mofs (N–cu–mof) nanomaterial-driven electrochemical aptasensor for sensitive detection of deoxynivalenol

3 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Complete recipeSource: Main

Route 1: Drop Cast

p008 · 3.3 Fabrication of the Electrochemical Aptasensor

Metal precursorsN-Cu-MOF/GCE control electrode

Linker precursorsAP1 aptamer sequence: 5'-C6-GCATCACTACAGTCATTACGCATCGTAGGGGGGATCGTTAAGGAAGTGCCCGGAGGCGGTATCGTGTGAAGTGCTGTCCC-3'

SolventsPBS rinse (1 mmol L-1, pH 5.0)

AdditivesAP1 deoxynivalenol aptamer

Atmospherenot specified

Temperature37 incubation; 4 storage

Time12 h incubation

Substrate orientationN-Cu-MOF coated glassy carbon electrode

Oxidant / reductantnone

Work-upDrop 5 uL AP1 on modified electrode; incubate; rinse with PBS to remove unbound AP1.

Activationstored at 4 C until use

Scalability contextElectrode-scale aptasensor assembly; no scale-up discussed.

Show 3 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	AP1 aptamer	5 uL · 10 umol L-1	p008 · 3.3 Fabrication of the Electrochemical Aptasensor
Electrolyte	PBS	rinse · 1 mmol L-1, pH 5.0	p008 · 3.3 Fabrication of the Electrochemical Aptasensor
Other	N-Cu-MOF/GCE	one modified electrode	p008 · 3.3 Fabrication of the Electrochemical Aptasensor

Partial recipeSource: Main

Route 2: Drop Cast

p008 · 3.3 Fabrication of the Electrochemical Aptasensor

Metal precursorsas-prepared N-Cu-MOF powder

Linker precursorsBTC linker already incorporated in N-Cu-MOF

Solventsdeionized water; PBS rinse (1 mmol L-1, pH 5.0)

Additivesnone

Atmosphereair / room temperature drying

Temperatureroom temperature drying

Time30 min ultrasonication; drying time not specified

Substrate orientationglassy carbon electrode surface

Oxidant / reductantnone

Work-upPolished GCE; N-Cu-MOF dispersion coated; dried; gently rinsed with PBS; dried.

Activationnone reported

Scalability contextElectrode-scale 5 uL aliquot on 3.0 mm GCE.

Show 3 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	N-Cu-MOF powder	5 uL aliquot of dispersion · 4 mg mL-1	p008 · 3.3 Fabrication of the Electrochemical Aptasensor
Solvent	deionized water	not specified	p008 · 3.3 Fabrication of the Electrochemical Aptasensor
Electrolyte	PBS	rinse · 1 mmol L-1, pH 5.0	p008 · 3.3 Fabrication of the Electrochemical Aptasensor

Partial recipeSource: Main

Route 3: Solvothermal

p008 · 3.2 Synthesis of N-Doped Cu-MOF

Metal precursors0.875 g Cu(NO3)2.3H2O

Linker precursors0.42 g H3BTC / 1,3,5-benzenetricarboxylic acid

SolventsDMF solution; fresh DMF wash; ethanol wash

Additives0.3 g PVP, average M.W. K17

Atmospherenot specified

Temperature80; dried at 60

Time24 h solvothermal; 12 h drying; 5 min initial stirring; 10 min after H3BTC addition

Oxidant / reductantnone separately specified

Work-upCollected by centrifugation; washed with fresh DMF twice and ethanol three times.

ActivationDried at 60 C for 12 h; no separate activation reported.

Scalability context100 mL Teflon-lined stainless-steel autoclave; scale-up not discussed.

Show 5 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	Cu(NO3)2.3H2O	0.875 g	p008 · 3.2 Synthesis of N-Doped Cu-MOF
Additive	PVP (average M.W. K17)	0.3 g	p008 · 3.2 Synthesis of N-Doped Cu-MOF
Solvent	DMF	not specified · >=99.8%	p008 · 3.2 Synthesis of N-Doped Cu-MOF
Linker	H3BTC	0.42 g	p008 · 3.2 Synthesis of N-Doped Cu-MOF
Solvent	ethanol	wash three times	p008 · 3.2 Synthesis of N-Doped Cu-MOF