Metal precursorsPreformed Co3(HITP)2 powder; KAuCl4.2H2O for Au@Si substrate
SolventsIsopropanol for catalyst ink; Milli-Q water, ethanol and acetone substrate sonication solvents
Additives5 wt% Nafion binder; NH4F, HF, Na2SO3, Na2SO3.5H2O and NH4Cl for electroless gold deposition
AtmosphereQuiescent conditions for gold deposition; ambient drying for catalyst film.
Temperatureambient drying
Time1 sonication for catalyst suspension
Substrate orientationUndoped Si(100) ATR FAC prism with nanostructured Au film; geometric exposed Au area 0.71 cm2
Oxidant / reductantElectroless Au deposition solution containing KAuCl4.2H2O and sulfite salts
Work-upSi prism mechanically polished, sonicated 10 min each in Milli-Q water, ethanol and acetone, immersed in 40% NH4F for 3 min, then plated to about 50 nm Au; Co3(HITP)2/Nafion ink dropped onto Au@Si and dried.
Scalability contextSpecialised SEIRAS substrate and electrochemical cell preparation; intended for mechanistic spectroscopy, not bulk catalyst scale-up.
Show 10 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|
| Other | Co3(HITP)2 | 5 mg mL-1 in isopropanol | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Solvent | isopropanol | Not specified | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Additive | Nafion | 5 wt% | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Other | Si(100) ATR FAC prism | Not specified | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Acid | aqueous NH4F | 3 min immersion · 40% | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Metal Source | KAuCl4.2H2O | 0.015 M | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Acid | HF | 2% | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Reductant | Na2SO3 | 0.15 M | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Reductant | Na2SO3.5H2O | 0.05 M | S8 · In-Situ ATR-SEIRAS · Figure S10 |
| Additive | NH4Cl | 0.05 M | S8 · In-Situ ATR-SEIRAS · Figure S10 |