Complete recipeSource: Both
Route 1: Other
SI PDF p2 and p11 / rendered p002 and p011 · Device fabrication
Metal precursorscomplex 1
SolventsN,N-dimethylformamide (DMF)
Atmosphereambient fabrication; main-text measurements in nitrogen-filled glove box
Temperature80 deg C drying after room-temperature spin coating
Time600 rpm for 5 min; 900 rpm for 5 min; dried several minutes
Substrate orientationITO-coated glass substrate; aluminium top electrode; shadow-mask active area 7.065 x 10^-2 cm^-2
Work-upFresh DMF dispersion (25 mg mL^-1) was spin-coated on ITO-coated glass, dried in a vacuum oven at 80 deg C, and capped with aluminium by vacuum coating.
Activationvacuum-oven drying at 80 deg C for several minutes to remove solvent
Scalability contextLaboratory spin-coated thin-film device; no scale-up discussed.
Show 4 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | complex 1 | 25 mg/ml dispersion · 25 mg/ml in DMF | SI PDF p2 and p11 / rendered p002 and p011 · Device fabrication |
| Solvent | N,N-dimethyl formamide (DMF) | not reported | SI PDF p2 and p11 / rendered p002 and p011 · Device fabrication |
| Other | ITO coated glass substrate | not reported | SI PDF p2 and p11 / rendered p002 and p011 · Device fabrication |
| Other | aluminium electrode | deposited by Vacuum Coating Unit | SI PDF p2 and p11 / rendered p002 and p011 · Device fabrication |