Measurement evidence
Modulating the redox states in a 3D conductive MOF for sweat ascorbic acid monitoring · Wang W.-Q., Xie H., Cheng F. et al. · Chemical Engineering Journal · 2025 · 169190
Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.
I2@FeTHQ-1 to I2@FeTHQ-5 · Powder
CV/EIS and elemental mapping for scaled-up and physically ground samples
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Scaled-up partition CV consistency | negligible performance variations | — | — | Text Qualitative | 2 · Results · Figure S9 |
| Physical-grinding CV/EIS behaviour | erratic changes with iodine content | — | — | Text Qualitative | 2 · Results · Figure S11-S12 |
I2@FeTHQ/ITO working electrode · Electrode
CV in three-electrode PBS/ITO setup; FeTHQ vs I2@FeTHQ and dopant controls
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Integrated CV area after Br2 treatment | 3.94 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after H2O2 treatment | 3.40 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after I2 treatmentMarked as a best value within this paper | 4.99 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after KI treatment | 2.82 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after NaBr treatment | 2.02 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after NaCl treatment | 1.77 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after NaIO4 treatment | 2.62 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after NaNO3 treatment | 1.85 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Integrated CV area after O3 treatment | 3.19 x 10-5 | — | — | SI Table Exact Reported | S20 · Table S3 |
| Optimised I2@FeTHQ anodic CV peak intensity | 0.15 mA cm-2 | — | — | Text Rounded Reported | 2 · Results |
| Optimised I2@FeTHQ cathodic CV peak intensity | -0.053 mA cm-2 | — | — | Text Exact Reported | 2 · Results |
| I2@FeTHQ redox CV peak potential | 0.09 V vs Ag/AgCl | — | — | Text Rounded Reported | 4 · Results · Figure 2a |
| I2@FeTHQ redox CV peak potential | -0.21 V vs Ag/AgCl | — | — | Text Rounded Reported | 4 · Results · Figure 2a |
I2@FeTHQ/ITO working electrode · Electrode
ITO working electrodes; equivalent circuit Rs/Rct fitting
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| FeTHQ charge transfer resistance Rct | 134.2 ohm | — | — | SI Table Exact Reported | S16 · Table S1 |
| I2@FeTHQ charge transfer resistance RctMarked as a best value within this paper | 10.35 ohm | — | — | SI Table Exact Reported | S16 · Table S1 |
| FeTHQ solution resistance Rs | 7.834 ohm | — | — | SI Table Exact Reported | S16 · Table S1 |
| I2@FeTHQ solution resistance Rs | 6.7 ohm | — | — | SI Table Exact Reported | S16 · Table S1 |
THQ/Fe precursor controls before and after iodine treatment · Unknown
CV and IT response of THQ/Fe precursor controls before/after iodine treatment
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Best precursor-control IT response | I2@Fe control larger than Fe/THQ/I2@THQ but below full I2@FeTHQ | — | — | Figure Axis Qualitative | S17 · Figure S22 |