cMOF Evidence Base

Synthesis evidence

Sensitive Detection of Alcohol Isomers by Ionically Conductive Metal-Organic Frameworks

Li L., Zhang S., Lu Y. et al. · Advanced Electronic Materials · 2022 · 2200542

2 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Both

Route 1: Liquid Liquid Interface

1 · Preparation of Co-TCPP IC-MOFs devices

Metal precursorsCo(NO3)2 aqueous solution; SI specifies Co(NO3)2.6H2O at 1 mmol/L
Linker precursorsH2TCPP in methanol; SI specifies 0.2 mmol/L
Solventswater; methanol
Atmosphereambient atmosphere not explicitly specified
Substrate orientationITO interdigital-electrode substrate submerged in cobalt nitrate aqueous solution; floating film deposited as solvent evaporated
Work-upFloating Co-TCPP MOF films deposited on the submerged substrate as solvent evaporated.
Scalability contextMain text describes easy preparation, tunable size and low cost.
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCo(NO3)2.6H2O1 mmol/L1 · Preparation of Co-TCPP IC-MOFs devices
LinkerH2TCPP0.2 mmol/L1 · Preparation of Co-TCPP IC-MOFs devices
SolventwaterNot specified1 · Preparation of Co-TCPP IC-MOFs devices
SolventmethanolNot specified1 · Preparation of Co-TCPP IC-MOFs devices
OtherITO substrate with interdigital electrodesNot specified1 · Preparation of Co-TCPP IC-MOFs devices
Partial recipeSource: Both

Route 2: Solvothermal

2 · Preparation of Co-TCPP devices without mobile metal ions

Metal precursorsCo(NO3)2.6H2O (0.8732 g, 3 mmol)
Linker precursorsH2TCPP (0.4288 g, 2 mmol)
Solvents18 mL N,N-diethylformamide (DMF); ethanol wash
Atmospherenot specified
Temperature85
Time24
Substrate orientationsample dropped onto conductive glass after washing and ultrasonic dispersion
Work-upCooled to 35 C at 10 C/h, washed with ethanol, ultrasonically dispersed, then drop-cast on conductive glass.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCo(NO3)2.6H2O0.8732 g, 3 mmol2 · Preparation of Co-TCPP devices without mobile metal ions
LinkerH2TCPP0.4288 g, 2 mmol2 · Preparation of Co-TCPP devices without mobile metal ions
SolventN,N-diethylformamide (DMF)18 mL2 · Preparation of Co-TCPP devices without mobile metal ions
Solventethanolwash2 · Preparation of Co-TCPP devices without mobile metal ions