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Waiprasoet S., Ittisanronnachai S., Worakajit P. et al. · ACS Applied Electronic Materials · 2024
Reported here: Solution-processed high-k oxide dielectric films
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| Paper and reported name | Formula and components | Structure context | Source |
|---|---|---|---|
| Solution-processed high-k oxide dielectric films2024 · Engineering High-k Oxide/CuSCN Interface for p-Channel Thin-Film Transistors | AlOx, GaOx, HfOxAl, Ga, or Hf oxide network components · not_applicable | 0D · Model SystemAmorphous high-k dielectric films; GIXRD showed no diffraction peaks up to 400 deg C annealing. | p.4 · 2.2. Characteristics of TFTs · Figure S5 |