Spectroscopy — Engineering High-k Oxide/CuSCN Interface for p-Channel Thin-Film Transistors

Measurement evidence

Spectroscopy

Engineering High-k Oxide/CuSCN Interface for p-Channel Thin-Film Transistors · Waiprasoet S., Ittisanronnachai S., Worakajit P. et al. · ACS Applied Electronic Materials · 2024 · 3510-3521

12 measurement groups · 39 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

X-ray photoelectron spectroscopy (XPS)

AlOx-200 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S1
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction46.0%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S1
other oxygen OII fraction54.0%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S1

X-ray photoelectron spectroscopy (XPS)

AlOx-300 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S1
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction55.0%Figure Axis
Approximate
p.2 · 2.1 Chemical States and Morphology · Figure S1
other oxygen OII fraction45.0%Figure Axis
Approximate
p.2 · 2.1 Chemical States and Morphology · Figure S1

X-ray photoelectron spectroscopy (XPS)

AlOx-400 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S1
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction75.9%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S1
other oxygen OII fraction24.1%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S1

XPS C 1s peak fitting

AlOx-200 dielectric film · Thin Film

C 1s narrow scan deconvoluted into carbon species; TEOS sample also checked by Si 2p in Figure S10.

Atmosphere
high vacuum
Geometry
modified dielectric film
Context
oxide/passivation interface component
Measurement source
p.5 · 2.3 Organic Modification Layer · Figure 4; Table 2; Figure S10
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
C-C/C-H peak position284.8 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
C-C/C-H peak area ratio67.1%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
amorphous/disordered C peak position285.3 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
amorphous/disordered C peak area ratio24.7%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
O-C=O peak position288.8 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
O-C=O peak area ratio8.2%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2

XPS C 1s peak fitting

AlOx/MAA modified dielectric · Thin Film

C 1s narrow scan deconvoluted into carbon species; TEOS sample also checked by Si 2p in Figure S10.

Atmosphere
high vacuum
Geometry
modified dielectric film
Context
oxide/passivation interface component
Measurement source
p.5 · 2.3 Organic Modification Layer · Figure 4; Table 2; Figure S10
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
C-C/C-H peak position284.8 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
C-C/C-H peak area ratio71.5%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
amorphous/disordered C peak position285.4 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
amorphous/disordered C peak area ratio18.5%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
O-C=O peak position288.8 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
O-C=O peak area ratio10.0%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2

XPS C 1s peak fitting

AlOx/TEOS modified dielectric · Thin Film

C 1s narrow scan deconvoluted into carbon species; TEOS sample also checked by Si 2p in Figure S10.

Atmosphere
high vacuum
Geometry
modified dielectric film
Context
oxide/passivation interface component
Measurement source
p.5 · 2.3 Organic Modification Layer · Figure 4; Table 2; Figure S10
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
C-C/C-H peak position284.8 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
C-C/C-H peak area ratio74.1%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
amorphous/disordered C peak position285.6 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
amorphous/disordered C peak area ratio13.1%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
C-O peak position286.7 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
C-O peak area ratio4.9%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
O-C=O peak position289.0 eVTable
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
O-C=O peak area ratio7.8%Table
Exact Reported
p.5 · 2.3 Organic Modification Layer · Table 2
Si 2p binding energy confirming TEOS102.8 eVText
Rounded Reported
p.5 · 2.3 Organic Modification Layer · Figure S10

X-ray photoelectron spectroscopy (XPS)

GaOx-200 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S2
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction70.7%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S2
other oxygen OII fraction29.3%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S2

X-ray photoelectron spectroscopy (XPS)

GaOx-300 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S2
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction78.0%Figure Axis
Approximate
p.2 · 2.1 Chemical States and Morphology · Figure S2
other oxygen OII fraction22.0%Figure Axis
Approximate
p.2 · 2.1 Chemical States and Morphology · Figure S2

X-ray photoelectron spectroscopy (XPS)

GaOx-400 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S2
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction85.4%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S2
other oxygen OII fraction14.6%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S2

X-ray photoelectron spectroscopy (XPS)

HfOx-200 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S3
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction72.5%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S3
other oxygen OII fraction27.5%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S3

X-ray photoelectron spectroscopy (XPS)

HfOx-300 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S3
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction83.0%Figure Axis
Approximate
p.2 · 2.1 Chemical States and Morphology · Figure S3
other oxygen OII fraction17.0%Figure Axis
Approximate
p.2 · 2.1 Chemical States and Morphology · Figure S3

X-ray photoelectron spectroscopy (XPS)

HfOx-400 dielectric film · Thin Film

Core-level metal and O 1s spectra; O 1s deconvoluted into lattice oxygen OI and other oxygen OII components.

Atmosphere
high vacuum; samples stored overnight in vacuum
Geometry
thin-film dielectric
Context
oxide dielectric component
Measurement source
p.2 · 2.1 Chemical States and Morphology · Figure S3
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
lattice oxygen OI fraction87.0%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S3
other oxygen OII fraction13.0%Text
Rounded Reported
p.2 · 2.1 Chemical States and Morphology · Figure S3