Complete recipeSource: Both
Route 1: Other
2 · Device fabrication and characterization · Fig. S1
SolventsDMSO dispersion medium; substrate cleaning with isopropanol, acetone and deionised water
Atmospherevacuum drying; Al deposition at 1 x 10^-6 Torr
Temperatureroom temperature for I-V measurement; drying temperature not specified
Substrate orientationITO-coated glass
Work-upITO ultrasonicated in isopropanol for 15 min, cleaned with acetone and deionised water, dried in vacuum; film vacuum-dried after spin coating.
Activationnone reported
Scalability contextSpin coating repeated four times; electrode area controlled by shadow mask at 7.065 x 10^-6 m2.
Show 3 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Solvent | dimethyl sulfoxide (DMSO) | not specified | 2 · Device fabrication and characterization · Fig. S1 |
| Other | compound 1 | not specified | 2 · Device fabrication and characterization · Fig. S1 |
| Other | aluminum electrodes | area 7.065 x 10^-6 m2 | 2 · Device fabrication and characterization · Fig. S1 |