Resistance versus electrode gap
TCNQ-infiltrated Cu3(BTC)2 thin-film device · Thin Film
TCNQ-infiltrated devices with 100, 150 and 200 um electrode gaps
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Resistance at 100 um electrode gap | approximately 0.23 x 10^6 ohm | — | — | Figure Axis Approximate | 2 · figure · Fig. 2B |
| Resistance at 150 um electrode gap | approximately 0.45 x 10^6 ohm | — | — | Figure Axis Approximate | 2 · figure · Fig. 2B |
| Resistance at 200 um electrode gap | approximately 1.0 x 10^6 ohm | — | — | Figure Axis Approximate | 2 · figure · Fig. 2B |