Diffraction Structure — Direct Electrodeposition of Electrically Conducting Ni3(HITP)2 MOF Nanostructures for Micro-Supercapacitor Integration

Measurement evidence

Diffraction Structure

Direct Electrodeposition of Electrically Conducting Ni3(HITP)2 MOF Nanostructures for Micro-Supercapacitor Integration · Behboudikhiavi S., Chanteux G., Babu B. et al. · Small · 2024 · 2401509

1 measurement group · 4 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Powder X-ray diffraction on scratched electrodeposited films

Optimised pulsed potentiostatic Ni3(HITP)2 film from MeOH-DMSO bath · Thin Film

PXRD patterns compared for simulated, chemical reference, potentiodynamic, aqueous potentiostatic, organic continuous and organic pulsed deposits.

Temperature
room temperature/not specified
Atmosphere
ambient measurement; synthesis under specified bath atmosphere
Geometry
scratched film powders; STOE Stadi P with Mo Kalpha in SI methods, plotted as Cu Kalpha-equivalent figure labels in captions
Context
pristine Ni3(HITP)2 phase purity
Measurement source
5-6 · Results and Discussion · Figure 3
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Direct electronic conductivity measurement in this papernot reported for electrodeposited Ni3(HITP)2 filmsabsence after main and SI reviewQualitative
Qualitative
1-10 · Full article review
Most crystalline aqueous potentiostatic deposition potentialMarked as a best value within this paper0.5 V provided the most crystalline and uniform filmText
Rounded Reported
4 · Results and Discussion · Figure S4A
PXRD impurity peaksNo other diffraction peaks identified in depositsqualitative absence statementText
Qualitative
5 · Results and Discussion · Figure 3
PXRD phase assignmentall Bragg peaks assigned to simulated and bulk chemically synthesised Ni3(HITP)2 phase for potentiostatic/pulsed depositsText
Qualitative
5 · Results and Discussion · Figure 3