Powder X-ray diffraction on scratched electrodeposited films
Optimised pulsed potentiostatic Ni3(HITP)2 film from MeOH-DMSO bath · Thin Film
PXRD patterns compared for simulated, chemical reference, potentiodynamic, aqueous potentiostatic, organic continuous and organic pulsed deposits.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Direct electronic conductivity measurement in this paper | not reported for electrodeposited Ni3(HITP)2 films | — | absence after main and SI review | Qualitative Qualitative | 1-10 · Full article review |
| Most crystalline aqueous potentiostatic deposition potentialMarked as a best value within this paper | 0.5 V provided the most crystalline and uniform film | — | — | Text Rounded Reported | 4 · Results and Discussion · Figure S4A |
| PXRD impurity peaks | No other diffraction peaks identified in deposits | — | qualitative absence statement | Text Qualitative | 5 · Results and Discussion · Figure 3 |
| PXRD phase assignment | all Bragg peaks assigned to simulated and bulk chemically synthesised Ni3(HITP)2 phase for potentiostatic/pulsed deposits | — | — | Text Qualitative | 5 · Results and Discussion · Figure 3 |