cMOF Evidence Base
Spectroscopy — Direct Electrodeposition of Electrically Conducting Ni3(HITP)2 MOF Nanostructures for Micro-Supercapacitor Integration

Measurement evidence

Spectroscopy

Direct Electrodeposition of Electrically Conducting Ni3(HITP)2 MOF Nanostructures for Micro-Supercapacitor Integration · Behboudikhiavi S., Chanteux G., Babu B. et al. · Small · 2024 · 2401509

2 measurement groups · 5 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

ATR-FTIR spectroscopy

Infrared spectroscopy

Optimised pulsed potentiostatic Ni3(HITP)2 film from MeOH-DMSO bath · Thin Film

As-synthesised Ni3(HITP)2 film samples on ITO after subtracting ITO background; 350-4000 cm-1, 2 cm-1 resolution, 16 scans.

Temperature
room temperature/not specified
Atmosphere
measurement atmosphere not specified
Geometry
film on ITO substrate
Context
pristine electrodeposited Ni3(HITP)2 film identity
Measurement source
SI-4 · Experimental Procedures 1.7
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Characteristic ATR-IR band regionaromatic bands in the 1200-1500 cm-1 region; SI caption gives 1200-1750 cm-1 for C=Carom, C=N, C-N and C-H modes—range 1200-1500 cm-1 in main text; 1200-1750 cm-1 in SI captionText
Range		5 · Results and Discussion · Figure S6
Unreacted ligand by ATR-IRNo signatures of unreacted ligand could be detected—qualitative absence statementText
Qualitative		5 · Results and Discussion · Figure S6

X-ray photoelectron spectroscopy, high-resolution Ni 2p region

X-ray photoelectron spectroscopy

Optimised pulsed potentiostatic Ni3(HITP)2 film from MeOH-DMSO bath · Thin Film

Scratched Ni3(HITP)2 sample synthesised by pulsed potentiostatic deposition at 0.8 V in MeOH/DMSO; rinsed with MeOH, scratched, dried under vacuum at RT before XPS.

Temperature
room temperature/not specified
Atmosphere
vacuum XPS; sample dried under vacuo at RT
Geometry
scratched powder from film
Context
pristine electrodeposited Ni3(HITP)2 purity
Measurement source
SI-4 · Experimental Procedures 1.7
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Reported Ni 2p peak at 854.79 eVNi2p1/2 at 854.79 eV (raw text; likely conventional Ni2p3/2 position)——Text
Exact Reported		5 · Results and Discussion · Figure S7
Reported Ni 2p peak at 872.38 eVNi2p3/2 at 872.38 eV (raw text; likely conventional Ni2p1/2 position)——Text
Exact Reported		5 · Results and Discussion · Figure S7
Parasitic nickel species by XPSassigned exclusively to Ni2+ in pure Ni3(HITP)2 without Ni0, Ni(OH)2 or NiO—qualitative absence statementText
Qualitative		5 · Results and Discussion · Figure S7