PXRD after chemical exposure
activated DDA-Cu MOF powder · Powder
Immersion in CH3OH, DMF, DCM, THF, 1 M HCl, 1 M NaOH, and 4 M LiTFSI in DOL/DME for 48 h
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| PXRD retention after chemical exposure | crystal structure maintained after solvent/electrolyte/acid/base immersion for 48 h | — | — | Text Qualitative | 4 · Results and Discussion · Figure S11 |