Complete recipeSource: Main
Route 1: Solvothermal
p002 · Preparation of HP-UiO-66
Metal precursors0.180 g ZrCl4; 0.223 g Zn(NO3)2
Linker precursors0.160 g H2BDC
Solvents20 mL anhydrous N,N-dimethylformamide (DMF)
AdditivesHydrochloric acid solution, pH = 1.0, used for etching
Atmospherenot reported
Temperature120
Time24
Work-upSonicate 20 min; heat at 120 C for 24 h; cool naturally; centrifuge; wash several times with DMF and acetone; disperse in pH 1.0 HCl and agitate about 10 min; centrifuge; wash several times with DMF and acetone.
ActivationDried at 60 C overnight in an oven.
Show 6 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Metal Source | ZrCl4 (Alfa Aesar) | 0.180 g | p002 · Preparation of HP-UiO-66 |
| Linker | H2BDC (Aladdin) | 0.160 g | p002 · Preparation of HP-UiO-66 |
| Metal Source | Zn(NO3)2 (Alfa Aesar) | 0.223 g | p002 · Preparation of HP-UiO-66 |
| Solvent | anhydrous N,N-dimethylformamide (DMF, Alfa Aesar) | 20 mL | p002 · Preparation of HP-UiO-66 |
| Acid | hydrochloric acid solution | pH = 1.0 | p002 · Preparation of HP-UiO-66 |
| Solvent | acetone | Not specified | p002 · Preparation of HP-UiO-66 |