Complete recipeSource: Main
Route 1: Solvothermal
7 · Experimental Section - CoPIZA Thin Film Synthesis
Metal precursorsCoCl2.6H2O (0.15 mmol)
Linker precursorsTCPP SAM on FTO; additional TCPP (0.05 mmol) in solvothermal mixture
SolventsDMSO for 0.1 mM TCPP SAM solution; 3.0 mL of 0.1 M pyridine/KOH aqueous solution; DMF wash
AdditivesKOH; pyridine
Atmospheresealed tube; gas atmosphere not specified
Temperature150
Time48
Substrate orientationFTO substrate; orientation not specified
Work-upPurple powder was filtered; powder and thin film were washed with DMF.
ActivationNo thermal/vacuum activation reported.
Scalability contextThin-film solvothermal deposition on FTO; no scale-up data reported.
Show 7 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | fluorine-doped tin oxide (FTO; Hartford Glass) | Not specified | 7 · Experimental Section - CoPIZA Thin Film Synthesis |
| Linker | meso-tetra-(4-carboxy)tetraphenyl porphine (TCPP; Frontier Scientific) | 0.05 mmol in solvothermal mixture · 0.1 mM in DMSO for SAM solution | 7 · Experimental Section - CoPIZA Thin Film Synthesis |
| Metal Source | cobalt(II) chloride hexahydrate (CoCl2.6H2O) | 0.15 mmol | 7 · Experimental Section - CoPIZA Thin Film Synthesis |
| Base | potassium hydroxide (KOH) | 0.1 M pyridine/KOH aqueous solution | 7 · Experimental Section - CoPIZA Thin Film Synthesis |
| Additive | pyridine, distilled before use | 0.1 M pyridine/KOH aqueous solution | 7 · Experimental Section - CoPIZA Thin Film Synthesis |
| Solvent | N,N-dimethylformamide (DMF) | wash solvent | 7 · Experimental Section - CoPIZA Thin Film Synthesis |
| Solvent | DMSO | TCPP/DMSO (0.1 mM) | 7 · Experimental Section - CoPIZA Thin Film Synthesis |