Complete recipeSource: SI
Route 1: Hydrothermal
S5 · Base addition sequence effect · Figure S2
Metal precursorsCu(NO3)2.2.5H2O (0.017 g, 0.072 mmol)
Linker precursorsTATHB (0.010 g, 0.036 mmol)
SolventsH2O, 10 mL copper solution plus 5 mL ligand solution
Additives60 uL of 6 M NH4OH added before ligand in base-first variant; compared with base-later route
Atmosphereair
Temperatureroom temperature; dried at 60 deg C
Time1 h reaction; 1 h vacuum drying
Work-upWashed and centrifuged with H2O and acetone (2 x 5 mL each).
Scalability contextOptimisation series only.
Show 4 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Metal Source | Cu(NO3)2.2.5H2O | 0.017 g, 0.072 mmol | S5 · Base addition sequence effect · Figure S2 |
| Linker | TATHB | 0.010 g, 0.036 mmol | S5 · Base addition sequence effect · Figure S2 |
| Solvent | H2O | 10 mL + 5 mL | S5 · Base addition sequence effect · Figure S2 |
| Base | NH4OH | 60 uL · 6 M | S5 · Base addition sequence effect · Figure S2 |