surface profilometry and shadow-mask device definition
compound 1 Al/compound/ITO Schottky thin-film device · Thin Film
Film thickness measured by surface profiler; effective diode area maintained by shadow mask.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| effective diode area | 7.065 x 10-6 m2 | — | — | Text Exact Reported | 7 · Fabrication of Schottky device |
| thin-film thickness | ~800 nm | — | — | Text Approximate | 7 · Fabrication of Schottky device |
| spin-coating speed | 800 rpm | — | — | Text Exact Reported | 7 · Fabrication of Schottky device |
| spin-coating time | 2 min | — | — | Text Exact Reported | 7 · Fabrication of Schottky device |