Partial recipeSource: Both
Route 1: Other
2 · Experimental Section - Bromine Vapor Doping · Figure S2
Metal precursorsCu[Cu(pdt)2] polycrystalline powder (100 mg)
Linker precursorspdt in preformed Cu[Cu(pdt)2]
Solventsnone for doping; bromine vapour injected
AdditivesBr2 vapour, variable volume
AtmosphereN2 after three pump-purge cycles
Temperature60 deg C anneal after room-temperature Br2 vapour exposure
Time24 h anneal after doping; exposure time not specified
Oxidant / reductantBr2 vapour acts as oxidant
Work-upSamples transferred to screw vials after doping.
ActivationAnnealed for 24 h at 60 deg C.
Scalability contextDoping performed using 100 mg MOF at a time; upper Br loading about x = 1 even under excess vapour.
Show 3 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | Cu[Cu(pdt)2] | 100 mg | 2 · Experimental Section - Bromine Vapor Doping · Figure S2 |
| Oxidant | bromine vapour (Br2) | different volumes; not specified · vapour, not liquid | 2 · Experimental Section - Bromine Vapor Doping · Figure S2 |
| Other | N2 | pump-purge three times | 2 · Experimental Section - Bromine Vapor Doping · Figure S2 |