ex situ XPS at selected states of charge
Ni-MOF working electrode · Electrode
Ni-MOF electrodes analysed between 0.5-3.0 V and 0.01-3.0 V after Ar plasma etching of 10 nm.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Ni(II) Ni 2p3/2 binding energy | 854.5 eV assigned to Ni(II) | — | — | Text Exact Reported | 4 · 3.3 · Figure 3b |
| Ni(II) Ni 2p1/2 binding energy | 871.8 eV assigned to Ni(II) | — | — | Text Exact Reported | 4 · 3.3 · Figure 3b |
| Ni(I) binding energy below 0.5 V | Ni(II) at 854.5 eV partly reduced to Ni(I) at 853.7 eV below 0.5 V | — | — | Text Exact Reported | 4 · 3.3 · Figure S6 |
| Ni valence stability in 0.5-3.0 V window | Ni remains divalent between 0.5 and 3.0 V | — | — | Text Qualitative | 4 · 3.3 · Figure 3b |