Synthesis evidence

Synthesis and structure of a non-van-der-Waals two-dimensional coordination polymer with superconductivity

Pan Z., Huang X., Fan Y. et al. · Nature Communications · 2024 · 9342

2 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Complete recipeSource: Both

Route 1: Liquid Liquid Interface

2 · Suppl. Note 2

Metal precursorsCuCl2 aqueous solution, 2 x 10^-2 mol/L, 200 mL
Linker precursorsBHT, 100 mg (0.37 mmol), dissolved in 200 mL hot toluene; BHT itself prepared from 1,2,3,4,5,6-hexakis(benzylthio)benzene and BBr3
SolventsWater, toluene, DMF, methanol, acetone, ethyl ether; BHT synthesis used dry fluorobenzene and methanol
AtmosphereMain methods state solvents were freeze-thaw degassed and air-/water-sensitive reactions were performed under nitrogen; SI chamber synthesis uses an oven and does not explicitly state nitrogen during the interface reaction.
Temperature75
Time168
Oxidant / reductantCu2+ is proposed to be partly reduced to Cu+ while BHT is oxidised to an anionic charge state of -4 during framework formation.
Work-upRemove remaining solvent by filtration; wash Cu3BHT film sequentially with DMF, methanol, acetone, and ethyl ether.
ActivationDry the film in a vacuum oven for 24 h; isolated crystals obtained by sonicating the film in methanol.
Scalability context500 mL flask recipe gives multicrystalline film containing microcrystals; higher temperature improves crystallinity, CuCl2 is most effective among Cu salts, and longer reaction time promotes larger crystals.
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCuCl2200 ml copper solution · 2 x 10-2 mol/L2 · Suppl. Note 2
LinkerBHT100 mg (0.37 mmol) · 1.85 mmol/L in toluene2 · Suppl. Note 2
Solventtoluene100 ml buffer layer plus 200 ml hot toluene for BHT2 · Suppl. Note 2
Solventwateraqueous copper solution2 · Suppl. Note 2
SolventDMF, methanol, acetone, ethyl ethersequential washes2 · Suppl. Note 2
Complete recipeSource: Main

Route 2: Other

7 · Device fabrication · Supplementary Fig. 12

Metal precursorsTi/Au contact metals deposited by magnetron sputtering
SolventsMethanol dispersion; MIBK developer; acetone lift-off
AdditivesMMA and PMMA electron-beam resists
Temperature150 and 170 for resist annealing
Time0.033 each for MMA and PMMA annealing
Substrate orientationPre-defined Si/SiO2 substrate; electrodes perpendicular to the crystal long axis to measure out-of-plane transport
Work-upSpin-coating of Cu3BHT/methanol dispersion; EBL at 30 kV; MIBK development; Ti/Au sputter deposition; acetone lift-off.
Scalability contextDevice fabrication is for single-crystal transport rather than bulk synthesis.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
SolventmethanolNot specified7 · Device fabrication · Supplementary Fig. 12
AdditiveMMA and PMMANot specified7 · Device fabrication · Supplementary Fig. 12
OtherTi/Au5 nm Ti / 250 nm Au7 · Device fabrication · Supplementary Fig. 12
SolventMIBK developer and acetone lift-off solventNot specified7 · Device fabrication · Supplementary Fig. 12