SEM, AFM, UV/Vis, TEM and SAED.
UV-visible and optical absorption spectroscopyScanning electron microscopyTransmission electron microscopyAtomic force microscopy
Cu3(HHTP)2-xC layer-by-layer thin-film series · Thin Film
Cycle-dependent film morphology and thickness characterised for Cu3(HHTP)2-xC.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Maximum RMS roughness for 100 nm film | less than 5 nm for the thin film with 100 nm thickness | — | upper bound | Text Range | main p.2, article p.16511 · AFM roughness discussion · Figure 2d |
| Cu3(HHTP)2-10C film thickness | about 20 nm | — | — | Text Approximate | main p.2, article p.16511 · TEM/SAED discussion · Figure 2g |
| Cu3(HHTP)2-50C film thickness | about 100 nm | — | — | Text Approximate | main p.2, article p.16511 · TEM/SAED discussion · Figure 2h |
| Film thickness increment per growth cycle | average 2 nm increment in thickness for each growing cycle | — | — | Text Rounded Reported | main p.2, article p.16511 · Thickness control · Figure 2c |
| UV/Vis absorbance growth trend | absorbance at 366 nm linearly proportional to growing cycles | — | — | Text Qualitative | main p.2, article p.16511 · UV/Vis growth monitoring · Figure 2e |