Atomic force microscopy (AFM)
CVD Cu3(C6O6)2 thin film on SiO2/Si · Thin Film
AFM surface roughness for films of different thicknesses on SiO2/Si.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| RMS roughness Rq for 165.8 nm film | Rq of 12.8 nm | — | — | Caption Exact Reported | SI S14 · Figure S6 caption · Figure S6 |
| RMS roughness Rq for 55.0 nm film | Rq of 9.87 nm | — | — | Caption Exact Reported | SI S14 · Figure S6 caption · Figure S6 |
| RMS roughness Rq for 662.7 nm film | Rq of 18.0 nm | — | — | Caption Exact Reported | SI S14 · Figure S6 caption · Figure S6 |