cMOF Evidence Base

Synthesis evidence

Unique Thermoelectric Properties Induced by Intrinsic Nanostructuring in a Polycrystalline Thin-Film Two-Dimensional Metal–Organic Framework, Copper Benzenehexathiol

Tsuchikawa R., Lotfizadeh N., Lahiri N. et al. · Physica Status Solidi (A) Applications and Materials Science · 2020 · 2000437

3 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Main

Route 1: Other

rendered page 3 / article p.2000437-3 · Characterization and Experiments

Atmosphereambient transfer/fabrication atmosphere not specified
Work-upExfoliated using elastic polymer stamps and transferred onto target substrates.
Vague recipeSource: Both

Route 2: Liquid Liquid Interface

SI text p.1 · I. Cu-BHT synthesis and characterization

Metal precursorscopper source not specified in local main/SI; copper benzenehexathiol prepared using literature reported procedures
Linker precursorsbenzenehexathiol prepared using a literature procedure
Solventsdry dichloromethane; dry methanol; dry ether; deionised water; 10% HCl (all degassed under argon)
Atmosphereargon degassing by multiple freeze-pump-thaw cycles for listed solvents/reagents
Work-upnot specified for Cu-BHT synthesis in local documents
Activationnot specified
Show 6 structured reagent records
RoleReagentAmount / concentrationSource
LinkerbenzenehexathiolNot specifiedSI text p.1 · I. Cu-BHT synthesis and characterization
Solventdry dichloromethaneNot specifiedSI text p.1 · I. Cu-BHT synthesis and characterization
Solventdry MethanolNot specifiedSI text p.1 · I. Cu-BHT synthesis and characterization
Solventdry etherNot specifiedSI text p.1 · I. Cu-BHT synthesis and characterization
Solventdeionized waterNot specifiedSI text p.1 · I. Cu-BHT synthesis and characterization
Acid10% HCl10%SI text p.1 · I. Cu-BHT synthesis and characterization
Partial recipeSource: SI

Route 3: Other

SI text p.2 · II.A. Device fabrication

AdditivesCr/Cu electrode metallisation; XeF2 dry etch
Substrate orientationundoped silicon substrate
Work-upElectron-beam lithography, Cr/Cu deposition, and XeF2 dry etching to suspend the Cu-BHT film.
Show 2 structured reagent records
RoleReagentAmount / concentrationSource
OtherCr/CuNot specifiedSI text p.2 · II.A. Device fabrication
OtherXeF2 gasNot specifiedSI text p.2 · II.A. Device fabrication