Microscopy Morphology — Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation

Measurement evidence

Microscopy Morphology

Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation · Guo Z., Panda D.K., Gordillo M.A. et al. · ACS Applied Materials and Interfaces · 2017 · 32413-32417

1 measurement group · 1 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

SEM-EDX

Scanning electron microscopy Elemental microanalysis and mapping

TTF-doped DSNDI-based MOF-74 powder · Powder

SEM-EDX data for undoped and TTF-doped MOF-74.

Context: Composition comparison
Measurement source: S-8 / render p008 · Figure S7 caption · Figure S7

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
SEM-EDX sulfur in TTF-doped MOF	S = 3.8 wt% from Figure S7 inset	—	inset sigma 0.0	Visual Estimate Approximate	S-8 / render p008 · Figure S7 inset · Figure S7