Synthesis evidence

Lowering Band Gap of an Electroactive Metal-Organic Framework via Complementary Guest Intercalation

Guo Z., Panda D.K., Gordillo M.A. et al. · ACS Applied Materials and Interfaces · 2017 · 32413-32417

3 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Complete recipeSource: SI

Route 1: Other

S-3 / render p003 · DSNDI Ligand

Linker precursors1,4,5,8-naphthalenetetracarboxylic dianhydride (NDA); 4-aminosalicylic acid
SolventsDMF (12 mL)
AdditivesMe3SiCl (6.4 mL, 50 mmol)
AtmosphereNot specified
Temperature150
Time14
Work-upCool to room temperature; filter precipitate; wash with EtOAc, 1 M aqueous NaOH, H2O, and MeOH; yellow solid obtained.
Scalability contextReported isolated ligand yield was 0.27 g, 5%.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
LinkerNDA2.68 g, 10 mmolS-3 / render p003 · DSNDI Ligand
Linker4-aminosalicylic acid4.6 g, 30 mmolS-3 / render p003 · DSNDI Ligand
AdditiveMe3SiCl6.4 mL, 50 mmolS-3 / render p003 · DSNDI Ligand
SolventDMF12 mLS-3 / render p003 · DSNDI Ligand
Complete recipeSource: Both

Route 2: Solvothermal

S-3 / render p003 · DSNDI-based MOF-74

Metal precursorsZn(NO3)2.6H2O (21 mg, 0.07 mmol)
Linker precursorsDSNDI ligand (17 mg, 0.03 mmol)
SolventsDMF/EtOH/H2O (3:0.5:0.5 mL)
Atmosphere20 mL sealed scintillation vial; gas atmosphere not otherwise specified
Temperature90
Time24
Work-upSonicate 5 min; heat; cool gradually; decant solvent; soak in fresh DMF (10 mL) for 5 h, repeated three times per day for 3 days; repeat same washing protocol with MeOH.
ActivationRemove trapped solvent under dynamic vacuum initially at room temperature, then heat at 80 °C for 24 h. For N2 sorption, MeOH-exchanged powder was further activated under high vacuum then at 100 °C for 24 h until outgas rate was <5 umHg/min.
Scalability contextYield reported as 76% based on DSNDI ligand.
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceZn(NO3)2.6H2O21 mg, 0.07 mmolS-3 / render p003 · DSNDI-based MOF-74
LinkerDSNDI ligand17 mg, 0.03 mmolS-3 / render p003 · DSNDI-based MOF-74
SolventDMF3 mLS-3 / render p003 · DSNDI-based MOF-74
SolventEtOH0.5 mLS-3 / render p003 · DSNDI-based MOF-74
SolventH2O0.5 mLS-3 / render p003 · DSNDI-based MOF-74
Complete recipeSource: Both

Route 3: Other

S-3 / render p003 · TTF-doped MOF-74

Metal precursorsActivated DSNDI-based MOF-74 framework contains Zn(II) nodes
Linker precursorsActivated DSNDI-based MOF-74
SolventsMeOH
AdditivesTTF guest
AtmosphereKept in the dark; atmosphere not otherwise specified
Temperatureroom temperature not explicitly stated
Time48
Oxidant / reductantTTF acts as electron-rich donor guest after intercalation
Work-upDecant solvent; wash solid with MeOH to remove excess non-entrapped TTF.
ActivationDry under vacuum for 16 h.
Scalability contextSmall-batch postsynthetic infiltration: 15 mg activated MOF in 3 mL guest solution.
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Otheractivated DSNDI-based MOF-7415 mgS-3 / render p003 · TTF-doped MOF-74
AdditiveTTF20 mMS-3 / render p003 · TTF-doped MOF-74
SolventMeOH3 mLS-3 / render p003 · TTF-doped MOF-74