Partial recipeSource: Main
Route 1: Other
1999 · Device fabrication and characterization
Metal precursorsThermally evaporated Al top electrode
SolventsDMF dispersion medium; propanol, ethanol, and distilled water for ITO cleaning
AtmosphereVacuum oven drying; vacuum coating for Al deposition
Temperature50
Substrate orientationITO-coated glass substrate
Work-upITO cleaned ultrasonically; compound 1 dispersion spin-coated at 1200 rpm for 2 min; dried in vacuum oven at 50 deg C; Al electrode deposited by thermal evaporation; diode area 7.065 x 10^-2 cm2.
ActivationNo framework activation reported; film dried at 50 deg C.
Scalability contextSpin-coated small-area device; no scale-up discussion.
Show 6 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | compound 1 | appropriate weight ratio | 1999 · Device fabrication and characterization |
| Solvent | DMF | Not specified | 1999 · Device fabrication and characterization |
| Solvent | propanol | used repeatedly for ITO cleaning | 1999 · Device fabrication and characterization |
| Solvent | ethanol | used repeatedly for ITO cleaning | 1999 · Device fabrication and characterization |
| Solvent | distilled water | used repeatedly for ITO cleaning | 1999 · Device fabrication and characterization |
| Other | Al | top electrode; deposited by thermal evaporation | 1999 · Device fabrication and characterization |