Electrical Transport — Anisotropic Redox Conductivity within a Metal-Organic Framework Material

10 measurement groups · 21 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Electrochemical impedance/CV comparison of electrolyte anions

Voltammetry

EPD NU-1000 thin film on ZnO-coated FTO · Electrode

Comparison of TBAPF6 and NaBARF electrolyte behaviour; Figure 6 reports 0.1 M acetonitrile solutions at 1.6 V vs Ag/AgCl.

Geometry: oriented thin-film electrode
Context: pristine NU-1000
Measurement source: 4 · Results and Discussion · Figure 6; Figure S8

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Effect of BARF/PF6 comparison for EPD films	For EPD films neither Dhopping nor sigma is sensitive to the size of the charge-compensating anion.	—	—	Text Qualitative	4 · Results and Discussion · Figure 6

Electrochemical impedance/CV comparison of electrolyte anions

Voltammetry

Solvothermal NU-1000 thin film on ZnO-coated FTO · Electrode

Comparison of TBAPF6 and NaBARF electrolyte behaviour; Figure 6 reports 0.1 M acetonitrile solutions at 1.6 V vs Ag/AgCl.

Geometry: oriented thin-film electrode
Context: pristine NU-1000
Measurement source: 4 · Results and Discussion · Figure 6; Figure S8

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Effect of BARF replacing PF6 for solvothermal films	two- to fourfold decreases in Dhopping and sigma	—	range 2-4 fold	Text Range	4 · Results and Discussion · Figure 6

Chronoamperometry potential-step/Cottrell analysis

Chronoamperometry

EPD NU-1000 thin film on ZnO-coated FTO · Electrode

1 M tetrabutylammonium PF6 in acetonitrile; forward and reverse potential steps across TPPy+/0.

Geometry: electrode-supported oriented thin film
Context: pristine NU-1000 thin film probing a,b-plane redox hopping
Measurement source: 10 · Table S2 · Table S2

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Dhopping in acetonitrile, EPD film, forward stepMarked as a best value within this paper	1.6 x 10^-14 cm2 s^-1	—	—	SI Table Rounded Reported	10 · Table S2 · Table S2
Dhopping in acetonitrile, EPD film, reverse step	1.4 x 10^-14 cm2 s^-1	—	—	SI Table Rounded Reported	10 · Table S2 · Table S2

Chronoamperometry potential-step/Cottrell analysis

Chronoamperometry

Solvothermal NU-1000 thin film on ZnO-coated FTO · Electrode

1 M tetrabutylammonium PF6 in acetonitrile; forward and reverse potential steps across TPPy+/0.

Geometry: electrode-supported oriented thin film
Context: pristine NU-1000 thin film probing c-direction redox hopping
Measurement source: 9-10 · Comparison of theoretical and experimental Dhopping ratio · Figure S7; Table S2

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Forward-step c-direction/a,b-plane Dhopping ratio in acetonitrileMarked as a best value within this paper	about 3500	—	—	Text Approximate	9 · Comparison of theoretical and experimental Dhopping ratio · Table S2
Reported reverse-step c-direction/a,b-plane Dhopping ratio in acetonitrile	about 180	—	Table S2 reverse values imply about 121-fold, but main footnote reports 180.	Text Approximate	6 · References/footnote 47
Dhopping in acetonitrile, solvothermal film, forward stepMarked as a best value within this paper	5.6 x 10^-11 cm2 s^-1	—	—	SI Table Rounded Reported	10 · Table S2 · Table S2
Dhopping in acetonitrile, solvothermal film, reverse step	1.7 x 10^-12 cm2 s^-1	—	—	SI Table Rounded Reported	10 · Table S2 · Table S2

Chronoamperometry potential-step/Cottrell analysis

Chronoamperometry

EPD NU-1000 thin film on ZnO-coated FTO · Electrode

1 M TBAPF6 in CH2Cl2; current density versus time^-1/2; forward step 0 to 1.8 V and reverse step 1.8 to 0 V versus Ag/AgCl.

Geometry: electrode-supported oriented thin film
Context: pristine NU-1000 thin film probing a,b-plane redox hopping
Measurement source: 3 · Results and Discussion · Figure 5D; Table 1

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Dhopping in CH2Cl2, EPD film, forward stepMarked as a best value within this paper	6 x 10^-13 cm2 s^-1	—	—	Table Rounded Reported	3 · Results and Discussion · Table 1
Dhopping in CH2Cl2, EPD film, reverse step	7 x 10^-13 cm2 s^-1	—	—	Table Rounded Reported	3 · Results and Discussion · Table 1

Chronoamperometry potential-step/Cottrell analysis

Chronoamperometry

Solvothermal NU-1000 thin film on ZnO-coated FTO · Electrode

1 M TBAPF6 in CH2Cl2; current density versus time^-1/2; forward step 0 to 1.6 V and reverse step 1.6 to 0 V versus Ag/AgCl.

Geometry: electrode-supported oriented thin film
Context: pristine NU-1000 thin film probing c-direction redox hopping
Measurement source: 3 · Results and Discussion · Figure 5C; Table 1

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Forward-step c-direction/a,b-plane Dhopping ratio in CH2Cl2	about 300-fold faster in the MOF crystallite c-direction than through the a,b-plane	—	reported as about 300-fold; table values give about 333-fold	Text Approximate	3 · Results and Discussion · Table 1
Dhopping in CH2Cl2, solvothermal film, forward stepMarked as a best value within this paper	2 x 10^-10 cm2 s^-1	—	—	Table Rounded Reported	3 · Results and Discussion · Table 1
Dhopping in CH2Cl2, solvothermal film, reverse step	3 x 10^-11 cm2 s^-1	—	—	Table Rounded Reported	3 · Results and Discussion · Table 1

Electrochemical impedance spectroscopy

Impedance spectroscopy

EPD NU-1000 thin film on ZnO-coated FTO · Electrode

EIS at applied potential 1.6 V vs Ag/AgCl; TBAPF6 in DCM, including 0.1, 0.5 and 1.0 M data in SI Figure S4.

Geometry: electrode-supported oriented thin film
Context: pristine NU-1000 thin film probing a,b-plane electrical conductivity
Measurement source: 6 · Figure S4 caption · Figure S4

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Electrical conductivity of EPD NU-1000 filmMarked as a best value within this paper	1.3 x 10^-9 S cm^-1	—	—	Text Rounded Reported	4 · Results and Discussion · Figure S4

Electrochemical impedance spectroscopy

Impedance spectroscopy

Solvothermal NU-1000 thin film on ZnO-coated FTO · Electrode

EIS at applied potential 1.6 V vs Ag/AgCl; TBAPF6 in DCM, including 0.1, 0.5 and 1.0 M data in SI Figure S4.

Geometry: electrode-supported oriented thin film
Context: pristine NU-1000 thin film probing c-direction electrical conductivity
Measurement source: 4 · Results and Discussion · Figure S4

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Average diffusion coefficient ratio referenced in SI Figure S4	about 180	—	—	Caption Approximate	6 · Figure S4 caption · Figure S4
Electrical conductivity of solvothermal NU-1000 filmMarked as a best value within this paper	1.2 x 10^-7 S cm^-1	—	—	Text Rounded Reported	4 · Results and Discussion · Figure S4
c-direction/a,b-plane electrical-conductivity ratio	about 100	—	reported as 100 times and about 100	Text Approximate	6 · Figure S4 caption · Figure S4

Redox-hopping rate calculation from Dhopping/r^2

EPD NU-1000 thin film on ZnO-coated FTO · Electrode

Derived from DCM/TBAPF6 potential-step data using a,b-plane effective hopping distance about 2.6 nm.

Geometry: oriented thin-film electrode
Context: pristine NU-1000
Measurement source: 7 · Table S1 · Table S1

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
EPD NU-1000 khopping, forward stepMarked as a best value within this paper	9 s^-1 (0 V to 1.8 V)	—	—	SI Table Rounded Reported	7 · Table S1 · Table S1
EPD NU-1000 khopping, reverse step	10 s^-1 (1.8 V to 0 V)	—	—	SI Table Rounded Reported	7 · Table S1 · Table S1

Redox-hopping rate calculation from Dhopping/r^2

Solvothermal NU-1000 thin film on ZnO-coated FTO · Electrode

Derived from DCM/TBAPF6 potential-step data using c-direction hopping distance r about 1.6 nm.

Geometry: oriented thin-film electrode
Context: pristine NU-1000
Measurement source: 7 · Table S1 · Table S1

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Solvothermal NU-1000 khopping, forward stepMarked as a best value within this paper	8600 s^-1 (0 V to 1.6 V)	—	—	SI Table Rounded Reported	7 · Table S1 · Table S1
Solvothermal NU-1000 khopping, reverse step	1300 s^-1 (1.6 V to 0 V)	—	—	SI Table Rounded Reported	7 · Table S1 · Table S1