Partial recipeSource: Main
Route 1: Drop Cast
p003 (journal p.524) · 2.4 Preparation of the Cu3(HHTP)2/GCE
Solventswater suspension of Cu3(HHTP)2; ethanol and deionized water used for rinsing
Additives0.3- and 0.05-um Al2O3 polishing powder
Atmospheredried in N2 during GCE cleaning; final drop-cast dried at room temperature
Temperatureroom temperature
Time5
Substrate orientationglassy carbon electrode surface
Work-upPolished GCE with Al2O3 powder, rinsed in ethanol and deionized water, dried in N2; dropped 5 uL Cu3(HHTP)2 aqueous suspension onto clean GCE surface; dried at room temperature for 5 h.
Show 4 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Other | Cu3(HHTP)2 suspension in water | 5 uL · not reported | p003 (journal p.524) · 2.4 Preparation of the Cu3(HHTP)2/GCE |
| Solvent | ethanol | rinse | p003 (journal p.524) · 2.4 Preparation of the Cu3(HHTP)2/GCE |
| Solvent | deionized water | rinse and suspension medium | p003 (journal p.524) · 2.4 Preparation of the Cu3(HHTP)2/GCE |
| Additive | Al2O3 powder | 0.3- and 0.05-um polishing powder | p003 (journal p.524) · 2.4 Preparation of the Cu3(HHTP)2/GCE |