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main p.6, article p.3458 · Growth and Characterization of MOF Thin Films
Metal precursorsNot specified in this paper; Cu3(BTC)2 liquid-phase layer-by-layer film growth cited to a previously described procedure.
Linker precursorsNot specified in this paper; BTC linker implied by Cu3(BTC)2.
SolventsLiquid phase; solvent not specified for framework growth in this paper.
AtmosphereVacuum only specified for activation, about 10^-6 Torr.
Temperatureroom temperature deposition described generally; activation at 180 deg C
Timeactivation 1 h; growth time not specified
Substrate orientationFused quartz substrate with prepatterned Au pads; no crystal orientation specified for substrate.
Work-upNot specified for growth; residual solvent and precursors removed by heating before infiltration.
ActivationHeated at 180 deg C in vacuum (about 10^-6 Torr) for 1 h before TCNQ infiltration.
Scalability contextAutomated layer-by-layer approach; grain size varies from tens of nanometres to about 1 um depending on film thickness and growth conditions.
Show 3 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|---|---|---|
| Metal Source | Cu source not specified in this paper | Not specified | main p.6, article p.3458 · Growth and Characterization of MOF Thin Films |
| Linker | BTC linker implied; exact reagent not specified in this paper | Not specified | main p.6, article p.3458 · Growth and Characterization of MOF Thin Films |
| Other | fused quartz substrate with prepatterned Au pads | 19 x 19 mm2, 0.55 mm thick; Au pads 200 x 500 um | main p.6, article p.3458 · Growth and Characterization of MOF Thin Films |