AFM and surface profilometry
Optimised 12-cycle Cu3(HHTT)2 film on SiO2/Si · Thin Film
12-cycle films prepared with varied precursor concentrations and solvents; thickness, RMS roughness, and roughness-to-thickness ratio tabulated.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| High-concentration RMS roughness | 11.8 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |
| Optimised 12-cycle RMS roughnessMarked as a best value within this paper | 4.86 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |
| DMF 12-cycle thickness | 31 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |
| High-concentration 12-cycle thickness | 227 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |
| IPA 12-cycle thickness | 71 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |
| Low-concentration 12-cycle thickness | 21 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |
| Optimised 12-cycle thicknessMarked as a best value within this paper | 132 nm | — | — | SI Table Exact Reported | p006 · Tables · Table S1 |