X-ray diffraction, Philips PW 3710, Cu Kalpha radiation
ZIF-8/PS thin film · Thin Film
50 keV, 40 mA; PS and ZIF-8/PS thin films compared.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| FWHM of PS Si peak | 0.159 deg for PS nanostructures | — | — | Text Exact Reported | 4 · Results and Discussion · Fig. 1 |
| FWHM of PS Si peak after ZIF-8 coating | 0.148 deg for ZIF-8/PS | — | — | Text Exact Reported | 4 · Results and Discussion · Fig. 1 |
| PS substrate Si(100) XRD peak position | 2theta = 69.5 deg | — | — | Text Rounded Reported | 3 · Results and Discussion · Fig. 1 |
| ZIF-8/PS (011) XRD peak position | 2theta = 7.5 deg | — | — | Text Rounded Reported | 4 · Results and Discussion · Fig. 1 |
| ZIF-8/PS (211) XRD peak position | 2theta = 12.6 deg | — | — | Text Rounded Reported | 4 · Results and Discussion · Fig. 1 |
| ZIF-8/PS (222) XRD peak position | 2theta = 18 deg | — | — | Text Rounded Reported | 4 · Results and Discussion · Fig. 1 |