Synthesis evidence

A conductive metal-organic framework photoanode

Pattengale B., Freeze J.G., Guberman-Pfeffer M.J. et al. · Chemical Science · 2020 · 9593-9603

7 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Vague recipeSource: SI

Route 1: Other

S2 · H4TTFTB Synthesis

Show 1 structured reagent record
RoleReagentAmount / concentrationSource
LinkerH4TTFTB (tetrathiafulvalene tetrabenzoic acid)Not specifiedS2 · H4TTFTB Synthesis
Complete recipeSource: SI

Route 2: Other

S2 · TiO2 and ZrO2 Film Preparation

Metal precursorsTiO2 (Ti-Nanoxide T/SP) nanoparticle paste; ZrO2 (Zr-Nanoxide ZT/SP) nanoparticle paste for ZrO2 controls
AdditivesScotch tape spacer layer
Atmosphereambient cooling
Temperature370 then 470
Time0.667
Substrate orientationdoctor blading on FTO or quartz substrates
Work-upcalcination; ambient cooling to room temperature
Activationcalcination at 370 C for 10 min, then 470 C for 30 min
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
OtherTiO2 (Ti-Nanoxide T/SP) nanoparticle pasteNot specifiedS2 · TiO2 and ZrO2 Film Preparation
OtherZrO2 (Zr-Nanoxide ZT/SP) nanoparticle pasteNot specifiedS2 · TiO2 and ZrO2 Film Preparation
OtherFTO or quartz substrateNot specifiedS2 · TiO2 and ZrO2 Film Preparation
Partial recipeSource: Both

Route 3: Solvothermal

S2 · Zn2TTFTB Film Growth

Metal precursorsZn(NO3)2·6H2O
Linker precursorsH4TTFTB
SolventsDMF and EtOH
Atmospheretightly capped vial; air not otherwise specified
Temperature40 to 75
Substrate orientationtwo cleaned FTO pieces placed back-to-back in a 20 mL glass scintillation vial
Work-upcool to room temperature; remove film from solution; rinse with DMF followed by EtOH; dry in air
Activationair drying only; no separate activation reported
Scalability contextSame procedure used for FTO, TiO2 and ZrO2 substrates.
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceZn(NO3)2·6H2O37 mg (0.2 mmoles)S2 · Zn2TTFTB Film Growth
LinkerH4TTFTB21 mg (0.03 mmoles)S2 · Zn2TTFTB Film Growth
SolventDMF2.6 mL + 2.6 mLS2 · Zn2TTFTB Film Growth
SolventETOH2.6 mL + 1.5 mLS2 · Zn2TTFTB Film Growth
Othercleaned FTO substratetwo piecesS2 · Zn2TTFTB Film Growth
Partial recipeSource: Both

Route 4: Solvothermal

9595 · Zn2TTFTB structural characterization · Figure S2; Figure S4

Metal precursorsZn(NO3)2·6H2O
Linker precursorsH4TTFTB
SolventsDMF and EtOH; no excess H2O
Atmospheretightly capped vial; air not otherwise specified
Temperature40 to 75
Substrate orientationno substrate for powder analogue
Work-upcool to room temperature; rinse with DMF then EtOH; dry in air
Activationallowed to dry in air
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceZn(NO3)2·6H2O37 mg (0.2 mmoles)9595 · Zn2TTFTB structural characterization · Figure S2; Figure S4
LinkerH4TTFTB21 mg (0.03 mmoles)9595 · Zn2TTFTB structural characterization · Figure S2; Figure S4
SolventDMF2.6 mL in metal solution; 2.6 mL in ligand solution9595 · Zn2TTFTB structural characterization · Figure S2; Figure S4
SolventETOH2.6 mL in metal solution; 1.5 mL in ligand solution9595 · Zn2TTFTB structural characterization · Figure S2; Figure S4
Vague recipeSource: Main

Route 5: Solvothermal

9594 · Results and discussion

Metal precursorsZn2+ ions; exact salt not repeated for standard literature synthesis
Linker precursorsH4TTFTB ligand
Solventsheated DMF/EtOH/H2O solution
Additivesexcess H2O in standard synthesis, inferred from film conditions excluding excess H2O
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceZn2+ ionsNot specified9594 · Results and discussion
LinkerH4TTFTB ligandNot specified9594 · Results and discussion
SolventDMF/ETOH/H2ONot specified9594 · Results and discussion
Partial recipeSource: Both

Route 6: Solvothermal

S2 · Zn2TTFTB Film Growth

Metal precursorsZn(NO3)2·6H2O
Linker precursorsH4TTFTB
SolventsDMF and EtOH
Atmospheretightly capped vial; air not otherwise specified
Temperature40 to 75
Substrate orientationtwo cleaned TiO2-coated substrates placed back-to-back in a 20 mL glass scintillation vial
Work-upcool to room temperature; remove film from solution; rinse with DMF followed by EtOH; dry in air
Activationair drying only; no separate activation reported
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceZn(NO3)2·6H2O37 mg (0.2 mmoles)S2 · Zn2TTFTB Film Growth
LinkerH4TTFTB21 mg (0.03 mmoles)S2 · Zn2TTFTB Film Growth
SolventDMF2.6 mL + 2.6 mLS2 · Zn2TTFTB Film Growth
SolventETOH2.6 mL + 1.5 mLS2 · Zn2TTFTB Film Growth
OtherTiO2-coated substratetwo piecesS2 · Zn2TTFTB Film Growth
Partial recipeSource: Both

Route 7: Solvothermal

S2 · Zn2TTFTB Film Growth

Metal precursorsZn(NO3)2·6H2O
Linker precursorsH4TTFTB
SolventsDMF and EtOH
Atmospheretightly capped vial; air not otherwise specified
Temperature40 to 75
Substrate orientationtwo cleaned ZrO2-coated substrates placed back-to-back in a 20 mL glass scintillation vial
Work-upcool to room temperature; remove film from solution; rinse with DMF followed by EtOH; dry in air
Activationair drying only; no separate activation reported
Show 5 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceZn(NO3)2·6H2O37 mg (0.2 mmoles)S2 · Zn2TTFTB Film Growth
LinkerH4TTFTB21 mg (0.03 mmoles)S2 · Zn2TTFTB Film Growth
SolventDMF2.6 mL + 2.6 mLS2 · Zn2TTFTB Film Growth
SolventETOH2.6 mL + 1.5 mLS2 · Zn2TTFTB Film Growth
OtherZrO2-coated substratetwo piecesS2 · Zn2TTFTB Film Growth