Noncontact AFM using Park Systems NX10
80 nm UiO-66 nanofilm · Thin Film
Olympus OMCLA160TS cantilever; 80 and 150 nm UiO-66 films compared with same height scale.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| RMS roughness, 150 nm film | 22 nm | — | — | Text Exact Reported | p006 / SI p6 · Figure S10 caption · Figure S10 |
| RMS roughness, 80 nm filmMarked as a best value within this paper | 13 nm | — | — | Text Exact Reported | p006 / SI p6 · Figure S10 caption · Figure S10 |