Microscopy Morphology — Tarnishing Silver Metal into Mithrene

2 measurement groups · 5 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

Thin Ag on Si(100) etch/no-reaction control · Thin Film

Elemental maps for [AgSePh]inf grown on thin 10 nm Ag on Si(100) under excess water; etch pits compared with MOCHA crystals

Atmosphere: Water-saturated reaction atmosphere during synthesis
Geometry: Thin Ag on Si(100)
Context: Competing side reaction on thin Ag/Si rather than ideal pristine film
Measurement source: S-6 · Figure S6 caption · Figure S6

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Etch pit composition	oxygen-rich and no coordination polymer elements	—	—	Caption Qualitative	S-6 · Figure S6 caption · Figure S6
Elements enriched over MOCHA crystals	carbon, silver, and selenium most intense over MOCHA crystals	—	—	Caption Qualitative	S-6 · Figure S6 caption · Figure S6

[AgSePh]inf progression films from 200 nm Ag · Thin Film

SEM images after 1, 3, 4, and 8 days and cross-sectional imaging after 8 days

Geometry: Film surface and cross-section
Context: Pristine tarnished [AgSePh]inf film grown from Ag
Measurement source: 13895 · Progression of the Tarnishing Reaction · Figure 5

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Cross-sectional mature film thickness after 8 daysMarked as a best value within this paper	approximately 255 nm	255 nm	—	Text Approximate	13896 · Progression of the Tarnishing Reaction · Figure 5b,c
Reported target crystalline film thickness range, upper bound	100 nm	100 nm	—	Text Range	13892 · Abstract
Reported target crystalline film thickness range, lower bound	5 nm	5 nm	—	Text Range	13892 · Abstract