Synthesis · Electrochemical deposition of Cu metal-organic framework films for the dual analysis of pathogens

3 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Partial recipeSource: Main

main p.3, article p.8996 · Treatment and Modification of the Electrode

Metal precursorsHAuCl4, 5 mM

Solventssolution solvent not specified

Atmospherenot specified

Time0.00833 h (30 s)

Substrate orientationCu-MOF/GCE immersed in HAuCl4 solution

Oxidant / reductantAuNP reduction on Cu-MOF surfaces at -0.5 V

Work-upNo separate workup specified after Au reduction.

Show 1 structured reagent record

Role	Reagent	Amount / concentration	Source
Metal Source	HAuCl4	5 mM	main p.3, article p.8996 · Treatment and Modification of the Electrode

Complete recipeSource: Both

main p.3, article p.8996 · Treatment and Modification of the Electrode

Metal precursorsCu(NO3)2.3H2O, 10 mM

Linker precursorsH3BTC, 15 mM

SolventsDMF

AdditivesEt3NHCl, 10 mM probase source

AtmosphereDeposition atmosphere not specified; electrode dried with high-purity nitrogen during preparation.

Temperature50 deg C drying after deposition

Time0.0833 h electrodeposition (5 min)

Substrate orientationCleaned 3 mm GCE immersed in precursor solution

Oxidant / reductantCathodic electrodeposition at -1.30 V

Work-upElectrode swiftly taken out and dried at 50 deg C.

Scalability contextAuthors state electrochemical deposition is rapid, efficient, easy and precisely controlled.

Show 4 structured reagent records

Role	Reagent	Amount / concentration	Source
Metal Source	Copper(II) nitrate trihydrate (Cu(NO3)2.3H2O)	10 mM	main p.3, article p.8996 · Treatment and Modification of the Electrode
Linker	1,3,5-benzenetricarboxylic acid (H3BTC)	15 mM	main p.3, article p.8996 · Treatment and Modification of the Electrode
Solvent	N,N-dimethylformamide (DMF)	Not specified	main p.3, article p.8996 · Treatment and Modification of the Electrode
Base	Triethylamine hydrochloride (Et3NHCl)	10 mM	main p.3, article p.8996 · Treatment and Modification of the Electrode

Partial recipeSource: Both

main p.3, article p.8996 · Biosensor Fabrication

Solventssolution medium not specified

Additives1 mM tris(2-carboxyethyl)phosphine; 1 mM 6-mercapto-1-hexanol

Atmospherenitrogen drying after rinsing

Temperature37 deg C for aptamer reduction/incubation

Time0.5 h aptamer reduction; 0.5 h MCH blocking

Substrate orientationAuNPs/Cu-MOF/GCE

Oxidant / reductantTCEP reduction of SH-DNA before immobilisation

Work-upRinsing, drying with nitrogen, MCH blocking, final rinsing.

Show 3 structured reagent records

Role	Reagent	Amount / concentration	Source
Other	S. aureus aptamer (SH-DNA)	0.5 uM in fabrication; optimised as 1 uM for supernatant and 0.25 uM for cell detection	main p.3, article p.8996 · Biosensor Fabrication
Reductant	tris(2-carboxyethyl)phosphine	1 mM	main p.3, article p.8996 · Biosensor Fabrication
Additive	6-mercapto-1-hexanol	1 mM	main p.3, article p.8996 · Biosensor Fabrication