Microscopy Morphology — Highly Selective and Sensitive Detection of Volatile Sulfur Compounds by Ionically Conductive Metal-Organic Frameworks

Measurement evidence

Microscopy Morphology

Highly Selective and Sensitive Detection of Volatile Sulfur Compounds by Ionically Conductive Metal-Organic Frameworks · Li L., Zhang S., Lu Y. et al. · Advanced Materials · 2021 · 2104120

2 measurement groups · 5 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

SEM surface and cross-section

Cu-TCPP IC-MOF thin-film sensor on ITO interdigital electrodes · Electrode

Surface and cross-section SEM of Cu-TCPP IC-MOF thin-film sensor

Geometry
ITO interdigital electrodes with IC-MOF sensing layer
Context
pristine Cu-TCPP IC-MOF
Measurement source
main p.3 · Results and Discussion · Figure 2e-f
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Cu-TCPP IC-MOF layer thicknessabout 220 nmText
Approximate
main p.3 · Results and Discussion · Figure 2f
ITO interdigital electrode thickness185 nmText
Exact Reported
main p.3 · Results and Discussion · Figure 2f

AFM thickness imaging

Cu-TCPP IC-MOF 100 nm thickness variant · Electrode

AFM images of IC-MOF films and thickness variants of 100, 200, and 300 nm

Geometry
Cu-TCPP IC-MOF film thickness variants
Context
pristine Cu-TCPP IC-MOF thickness controls
Measurement source
SI p.14 · Supporting Figure Captions · Figure S11
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
AFM Cu-TCPP thickness variant100 nmCaption
Rounded Reported
SI p.14 · Supporting Figure Captions · Figure S11
AFM Cu-TCPP thickness variant200 nmCaption
Rounded Reported
SI p.14 · Supporting Figure Captions · Figure S11
AFM Cu-TCPP thickness variant300 nmCaption
Rounded Reported
SI p.14 · Supporting Figure Captions · Figure S11