cMOF Evidence Base
Microscopy Morphology — Chemical Vapor Deposition and High-Resolution Patterning of a Highly Conductive Two-Dimensional Coordination Polymer Film

Measurement evidence

Microscopy Morphology

Chemical Vapor Deposition and High-Resolution Patterning of a Highly Conductive Two-Dimensional Coordination Polymer Film · Rubio-Gimenez V., Arnauts G., Wang M. et al. · Journal of the American Chemical Society · 2023 · 152-159

2 measurement groups · 9 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

AFM topography and scratch-profile thickness measurement

Atomic force microscopy

CVD Cu-BHT nanofilm series · Thin Film

Bruker Multimode 8 AFM in tapping mode under ambient conditions; Gwyddion analysis.

Atmosphere
ambient
Geometry
CVD nanofilm
Context
pristine Cu-BHT films
Measurement source
SI p.S5 and p.S11 · Atomic force microscopy · Figure 2b-c; Figures S7-S8
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
CuO-to-Cu-BHT thickness expansion factor7x expansion——Caption
Rounded Reported		main p.3 / article p.C · Figure caption · Figure 2d
Maximum controlled CVD Cu-BHT thickness in main series85 nm——Text
Rounded Reported		main p.1 / article p.A · Abstract
Minimum controlled CVD Cu-BHT thickness in main series20 nm——Text
Rounded Reported		main p.1 / article p.A · Abstract
RMS roughness of 20 nm CVD Cu-BHT film5.7 +/- 1.6 nm—+/- 1.6 nmText
Exact Reported		main p.2 / article p.B · Results and Discussion · Figures S7-S8
RMS roughness of 85 nm CVD Cu-BHT film10.8 +/- 1.7 nm—+/- 1.7 nmText
Exact Reported		main p.2 / article p.B · Results and Discussion · Figures S7-S8
Comparator roughness for solution-based 2D MOG films>13 nm——Text
Approximate		main p.2 / article p.B · Results and Discussion

SEM, AFM and confocal microscopy of patterned Cu-BHT features

Scanning electron microscopyAtomic force microscopy

Bottom-up lift-off patterned CVD Cu-BHT features · Thin Film

Bottom-up additive lithography patterns; SEM/AFM close-ups and confocal images.

Geometry
interdigitated electrodes, circular features, line patterns and logos
Context
pristine patterned Cu-BHT features
Measurement source
main p.4-p.5 / article p.D-E · Results and Discussion · Figure 3; Figure S13
PropertyReported valueNormalised valueUncertaintyOrigin and qualitySource
Minimum circular feature radius500 nm radius0.5 um—Text
Rounded Reported		main p.5 / article p.E · Results and Discussion · Figure 3c
Interdigitated electrode finger width2 um2000 nm—Text
Rounded Reported		main p.5 / article p.E · Results and Discussion · Figure 3b
Minimum interdigitated-electrode separationMarked as a best value within this paper750 nm0.75 um—Text
Rounded Reported		main p.5 / article p.E · Results and Discussion · Figure 3b