Synthesis evidence

From 0D to 2D: Microwave-assisted synthesis of electrically conductive metal-organic frameworks with controlled morphologies

Fang X., Choi J.Y., Lu C. et al. · Chemical Science · 2025 · 3168-3172

9 structured synthesis routes

Completeness describes how fully the route could be reconstructed from the main article and supporting information.

Complete recipeSource: SI

Route 1: Other

SI p.S3 · Synthesis of Cu-HHTP

Metal precursorsCu(NO3)2.2.5H2O (0.0355 g, 0.15 mmol).
Linker precursorsHHTP ligand (0.0259 g, 0.08 mmol).
SolventsDMF (10 mL); wash solvents acetone, H2O, DMF and ethanol.
AdditivesTemperature-controlled ultrasonication with ice bath.
AtmosphereNot specified for synthesis; drying under reduced pressure.
Temperature0 deg C ultrasonication bath for 1 h; microwave at 100 deg C for 15 min; dry at 70 deg C.
Time1 h ultrasonication plus 0.25 h microwave reaction.
Work-upBlack precipitate isolated by centrifugation; washed with acetone (35 mL), H2O (2 x 15 mL), DMF (2 x 15 mL), ethanol (2 x 15 mL).
ActivationDried in a 70 deg C oven under reduced pressure for further characterization.
Scalability contextYield after solvent removal was 0.0055 g (16%).
Show 7 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu(NO3)2.2.5H2O0.0355 g, 0.15 mmolSI p.S3 · Synthesis of Cu-HHTP
LinkerHHTP ligand0.0259 g, 0.08 mmolSI p.S3 · Synthesis of Cu-HHTP
SolventDMF10 mLSI p.S3 · Synthesis of Cu-HHTP
Solventacetone wash35 mLSI p.S3 · Synthesis of Cu-HHTP
SolventH2O wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
SolventDMF wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
Solventethanol wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
Complete recipeSource: SI

Route 2: Other

SI p.S3 · Synthesis of Cu-HHTP

Metal precursorsCu(NO3)2.2.5H2O (0.0355 g, 0.15 mmol).
Linker precursorsHHTP ligand (0.0259 g, 0.08 mmol).
SolventsDMF (10 mL); wash solvents acetone, H2O, DMF and ethanol.
AdditivesBrief sonication to dissolve reactants; no additional modulator reported.
AtmosphereNot specified for synthesis; drying under reduced pressure.
TemperatureMicrowave at 100 deg C for 15 min; dry at 70 deg C.
Time0.25 h microwave reaction.
Work-upBlack precipitate isolated by centrifugation; washed with acetone (35 mL), H2O (2 x 15 mL), DMF (2 x 15 mL), ethanol (2 x 15 mL).
ActivationDried in a 70 deg C oven under reduced pressure for further characterization.
Scalability contextYield after solvent removal was 0.0062 g (19%).
Show 7 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu(NO3)2.2.5H2O0.0355 g, 0.15 mmolSI p.S3 · Synthesis of Cu-HHTP
LinkerHHTP ligand0.0259 g, 0.08 mmolSI p.S3 · Synthesis of Cu-HHTP
SolventN,N-Dimethylformamide (DMF)10 mLSI p.S3 · Synthesis of Cu-HHTP
Solventacetone wash35 mLSI p.S3 · Synthesis of Cu-HHTP
SolventH2O wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
SolventDMF wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
Solventethanol wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
Complete recipeSource: SI

Route 3: Other

SI p.S3 · Synthesis of Cu-HHTP

Metal precursorsCu(NO3)2.2.5H2O (0.0355 g, 0.15 mmol).
Linker precursorsHHTP ligand (0.0259 g, 0.08 mmol).
SolventsDMF (4 mL) plus H2O (2 mL) for HHTP; H2O (4 mL) plus NH4OH (0.6 mL) for copper source; wash solvents H2O, DMF and ethanol.
AdditivesNH4OH (0.6 mL).
AtmosphereNot specified for synthesis; drying under reduced pressure.
TemperatureMicrowave at 100 deg C for 15 min; dry at 70 deg C.
Time0.25 h microwave reaction.
Work-upBlack precipitate isolated by centrifugation; washed with H2O (2 x 15 mL), DMF (2 x 15 mL), and ethanol (2 x 10 mL).
ActivationDried in a 70 deg C oven under reduced pressure for further characterization.
Scalability contextYield after solvent removal was 0.0245 g (74%).
Show 9 structured reagent records
RoleReagentAmount / concentrationSource
Metal SourceCu(NO3)2.2.5H2O0.0355 g, 0.15 mmolSI p.S3 · Synthesis of Cu-HHTP
LinkerHHTP ligand0.0259 g, 0.08 mmolSI p.S3 · Synthesis of Cu-HHTP
SolventDMF4 mLSI p.S3 · Synthesis of Cu-HHTP
SolventH2O for HHTP solution2 mLSI p.S3 · Synthesis of Cu-HHTP
SolventH2O for Cu solution4 mLSI p.S3 · Synthesis of Cu-HHTP
BaseNH4OH0.6 mLSI p.S3 · Synthesis of Cu-HHTP
SolventH2O wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
SolventDMF wash2 x 15 mLSI p.S3 · Synthesis of Cu-HHTP
Solventethanol wash2 x 10 mLSI p.S3 · Synthesis of Cu-HHTP
Complete recipeSource: SI

Route 4: Drop Cast

SI p.S2 · Electrochemical Measurements

SolventsIPA (2 mL) for slurry; 0.5 M Na2SO4 aqueous electrolyte.
AdditivesNafion (5 wt%, 5 uL).
AtmosphereNa2SO4 electrolyte prepared in degassed water.
Time30 min sonication of slurry.
Substrate orientation1 cm x 2 cm ITO glass electrode, back-illuminated through ITO.
Work-up0.05 g MOF powder ground with Nafion, mixed with IPA under sonication, then drop-cast on ITO glass.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
OtherMOF powders0.05 gSI p.S2 · Electrochemical Measurements
AdditiveNafion5 uL · 5 wt%SI p.S2 · Electrochemical Measurements
SolventIPA2 mLSI p.S2 · Electrochemical Measurements
ElectrolyteNa2SO47.10 g in 100 mL degassed water · 0.5 MSI p.S2 · Electrochemical Measurements
Complete recipeSource: SI

Route 5: Drop Cast

SI p.S2 · Electrochemical Measurements

SolventsIPA (2 mL) for slurry; 0.5 M Na2SO4 aqueous electrolyte.
AdditivesNafion (5 wt%, 5 uL).
AtmosphereNa2SO4 electrolyte prepared in degassed water.
Time30 min sonication of slurry.
Substrate orientation1 cm x 2 cm ITO glass electrode, back-illuminated through ITO.
Work-up0.05 g MOF powder ground with Nafion, mixed with IPA under sonication, then drop-cast on ITO glass.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
OtherMOF powders0.05 gSI p.S2 · Electrochemical Measurements
AdditiveNafion5 uL · 5 wt%SI p.S2 · Electrochemical Measurements
SolventIPA2 mLSI p.S2 · Electrochemical Measurements
ElectrolyteNa2SO47.10 g in 100 mL degassed water · 0.5 MSI p.S2 · Electrochemical Measurements
Complete recipeSource: SI

Route 6: Drop Cast

SI p.S2 · Electrochemical Measurements

SolventsIPA (2 mL) for slurry; 0.5 M Na2SO4 aqueous electrolyte.
AdditivesNafion (5 wt%, 5 uL).
AtmosphereNa2SO4 electrolyte prepared in degassed water.
Time30 min sonication of slurry.
Substrate orientation1 cm x 2 cm ITO glass electrode, back-illuminated through ITO.
Work-up0.05 g MOF powder ground with Nafion, mixed with IPA under sonication, then drop-cast on ITO glass.
Show 4 structured reagent records
RoleReagentAmount / concentrationSource
OtherMOF powders0.05 gSI p.S2 · Electrochemical Measurements
AdditiveNafion5 uL · 5 wt%SI p.S2 · Electrochemical Measurements
SolventIPA2 mLSI p.S2 · Electrochemical Measurements
ElectrolyteNa2SO47.10 g in 100 mL degassed water · 0.5 MSI p.S2 · Electrochemical Measurements
Complete recipeSource: SI

Route 7: Drop Cast

SI p.S2 · Electrochemical Measurements

Solvents0.1 M TEBF4 in acetonitrile used as electrolyte for electrochemical measurements.
AdditivesPTFE binder solution (60 wt% in H2O).
AtmosphereElectrolyte degassed for 10 min with nitrogen before measurements.
Substrate orientationGlassy carbon working electrode.
Work-upInk composed of 80 wt% MOF powder and 20 wt% PTFE binder was drop-cast on glassy carbon.
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
OtherMOF powders80 wt% of inkSI p.S2 · Electrochemical Measurements
AdditivePTFE binder solution20 wt% of ink · 60 wt% in H2OSI p.S2 · Electrochemical Measurements
Electrolytetetraethylammonium tetrafluoroborate (TEBF4)4.34 g in 200 mL acetonitrile · 0.1 MSI p.S2 · Electrochemical Measurements
Complete recipeSource: SI

Route 8: Drop Cast

SI p.S2 · Electrochemical Measurements

Solvents0.1 M TEBF4 in acetonitrile used as electrolyte for electrochemical measurements.
AdditivesPTFE binder solution (60 wt% in H2O).
AtmosphereElectrolyte degassed for 10 min with nitrogen before measurements.
Substrate orientationGlassy carbon working electrode.
Work-upInk composed of 80 wt% MOF powder and 20 wt% PTFE binder was drop-cast on glassy carbon.
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
OtherMOF powders80 wt% of inkSI p.S2 · Electrochemical Measurements
AdditivePTFE binder solution20 wt% of ink · 60 wt% in H2OSI p.S2 · Electrochemical Measurements
Electrolytetetraethylammonium tetrafluoroborate (TEBF4)4.34 g in 200 mL acetonitrile · 0.1 MSI p.S2 · Electrochemical Measurements
Complete recipeSource: SI

Route 9: Drop Cast

SI p.S2 · Electrochemical Measurements

Solvents0.1 M TEBF4 in acetonitrile used as electrolyte for electrochemical measurements.
AdditivesPTFE binder solution (60 wt% in H2O).
AtmosphereElectrolyte degassed for 10 min with nitrogen before measurements.
Substrate orientationGlassy carbon working electrode.
Work-upInk composed of 80 wt% MOF powder and 20 wt% PTFE binder was drop-cast on glassy carbon.
Show 3 structured reagent records
RoleReagentAmount / concentrationSource
OtherMOF powders80 wt% of inkSI p.S2 · Electrochemical Measurements
AdditivePTFE binder solution20 wt% of ink · 60 wt% in H2OSI p.S2 · Electrochemical Measurements
Electrolytetetraethylammonium tetrafluoroborate (TEBF4)4.34 g in 200 mL acetonitrile · 0.1 MSI p.S2 · Electrochemical Measurements