Conductivity survey of electron-beam and stencil-mask fabricated single-crystal devices
Ni-CAT-1 single-crystal electron-beam-lithography device · Electrode
Conductivity plotted versus crystal size for both fabrication methods; stencil-mask devices under vacuum, e-beam devices in ambient environment.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Conductivity spread across devices | varies by two orders of magnitude | — | — | Caption Approximate | S16 · Figure caption · Figure S11D |
| Number of device samples in conductivity survey | 21 samples | — | — | Caption Exact Reported | S16 · Figure caption · Figure S11D |
| Conductivity increase under vacuum | increases by one order of magnitude under vacuum | — | — | Caption Approximate | S16 · Figure caption · Figure S11D |
| Device fabrication yield | about 50% | — | — | Caption Approximate | S16 · Figure caption · Figure S11 |