Microscopy Morphology — Electrochemical Synthesis of Large Area Two-Dimensional Metal–Organic Framework Films on Copper Anodes

4 measurement groups · 13 results

Reported values remain attached to the sample, method, conditions, extraction quality and source location that produced them.

As-grown Cu3(HHTP)2 MOF film on single-crystal Cu(100) anode · Thin Film

As-grown or transferred Cu3(HHTP)2 films; in-situ AFM for 10 x 10 mm regions on Cu foil.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
AFM terrace step height 1	3.5 nm	—	—	Text Rounded Reported	main p.2 · Characterisation · Figure 1f
AFM terrace step height 2	8.8 nm	—	—	Text Rounded Reported	main p.2 · Characterisation · Figure 1f
Upper limit of Cu3(HHTP)2 film thickness	about 60 nm; measured 59.79 nm	—	—	Caption Rounded Reported	SI p.S12 · Section 9 · Figure S11
Average Ra roughness	Ra average 1.6 nm	—	—	Text Rounded Reported	SI p.S13 · Section 10 · Figure S12
RMS roughness from AFM image	RMS roughness about 2.5 nm	—	—	Caption Approximate	SI p.S12 · Section 9 · Figure S11
Average Rq roughness	Rq average 2.3 nm	—	—	Text Rounded Reported	SI p.S13 · Section 10 · Figure S12

As-grown Cu3(HHTP)2 MOF film on single-crystal Cu(100) anode · Thin Film

Coverage plotted for 0.15, 0.20, 0.40 and 0.80 V over reaction time.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Coverage at 0.40 V after 3000 s	about 100% at 3000 s	—	graphical estimate	Figure Axis Approximate	SI p.S15 · Section 11 · Figure S15
Coverage at 0.80 V after 1500 s	about 100% at 1500 s	—	graphical estimate	Figure Axis Approximate	SI p.S15 · Section 11 · Figure S15

As-grown Cu3(HHTP)2 MOF film on single-crystal Cu(100) anode · Thin Film

Large-area Cu foil film, optical image and SEM image; Cu passing-rate and reaction-rate morphology in SI.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Annealed Cu(100) substrate XRD peak	2theta = 50.61 deg	—	—	Text Exact Reported	SI p.S5 · Section 4 · Figure S3
Large-area film diameter	4-inch Cu3(HHTP)2 film	—	—	Caption Rounded Reported	main p.3 · Electrical properties · Figure 3a
Cu-anode passing rate for full coverage	0.5 cm min-1 gives 100% coverage	100 % coverage	—	Text Rounded Reported	SI p.S4 · Section 3 · Figure S2

As-grown Cu3(HHTP)2 MOF film on single-crystal Cu(100) anode · Thin Film

Microstructure of Cu3(HHTP)2 MOF film; comparison with other methods in SI.

Property	Reported value	Normalised value	Uncertainty	Origin and quality	Source
Average crystalline domain size	nearly 80 nm	—	—	Text Approximate	main p.2 · Structure · Figure S20a
HRTEM lattice spacing for (100) plane	about 2.1 nm	—	—	Text Approximate	main p.2 · Structure · Figure 2d