Metal precursorscobalt acetate, amount not separately given for ITO in SI
Linker precursorsHHTP precursor (5.4 x 10^-3 mmol; 1.75 mg)
Solventswater and 1-propanol (1 mL : 1 mL) precursor solution; autoclave reservoir water and 1-propanol (2.5 mL : 2.5 mL)
Additivessalicylic acid modulator, inferred from main text
Atmospheresealed autoclave; materials generally handled in air unless otherwise noted
Temperature85
Time18
Substrate orientationITO-coated glass
Oxidant / reductantnone reported
Work-upcool 10 min, rinse with dry acetone; ITO films further dried under dynamic vacuum in main text
Activationnone reported after synthesis except electrochemical samples activated separately
Scalability contextFour set-ups were placed in the autoclave.
Show 5 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|
| Linker | HHTP precursor | 5.4 x 10^-3 mmol; 1.75 mg · 5.35 mmol L^-1 in deposited precursor solution | p005 · Transparent/oxide-substrate VAC synthesis |
| Metal Source | cobalt acetate, amount not separately given for ITO in SI | as listed in precursor_metals · NiAc 10.7 mmol L^-1 or CoAc 12.85 mmol L^-1 where reported | p005 · Transparent/oxide-substrate VAC synthesis |
| Acid | salicylic acid modulator, inferred from main text | salicylic acid modulator, inferred from main text · as listed in additives | p005 · Transparent/oxide-substrate VAC synthesis |
| Solvent | water | 1 mL precursor + 2.5 mL reservoir | p005 · Transparent/oxide-substrate VAC synthesis |
| Solvent | 1-propanol | 1 mL precursor + 2.5 mL reservoir | p005 · Transparent/oxide-substrate VAC synthesis |