Metal precursorsCu(OAc)2 solution, 1 mM
Linker precursorsTripeptide ligand GHL solution, 20 mM
SolventsH2O/EtOH 1:1; ethanol wash
AdditivesNaOH and 30% hydrogen peroxide for OH-functionalization of Si/SiO2 substrate
AtmosphereDried under nitrogen flux after substrate functionalization; otherwise room temperature and air unless specified.
Temperature80 C for substrate OH-functionalization; room temperature for LPE-LBL growth
TimeSubstrate functionalization 0.5 h; each growth cycle: 10 min Cu(OAc)2 immersion plus 15 min GHL immersion; 20 cycles total.
Substrate orientationFunctionalized Si/SiO2 substrate; quartz also used for optical thin-film preparation/baseline measurements.
Oxidant / reductant30% hydrogen peroxide in 3:1 2 mM NaOH/H2O2 substrate-treatment solution
Work-upRinse with deionized water after functionalization; ethanol wash after each LPE-LBL step to remove residual reactants.
ActivationNo pore activation reported for the thin film.
Scalability contextMain article describes wafer-scale multilevel chiral MOF thin film and shows a wafer-scale array device.
Show 6 structured reagent records
| Role | Reagent | Amount / concentration | Source |
|---|
| Metal Source | Cu(OAc)2 | 1 mM | SI p.6 · Synthesis of chiral CAS-4 thin film · Figure 1a; Figure 2 |
| Linker | tripeptide ligand GHL | 20 mM | SI p.6 · Synthesis of chiral CAS-4 thin film · Figure 1a; Figure 2 |
| Solvent | H2O and EtOH | 1:1 mixture | SI p.6 · Synthesis of chiral CAS-4 thin film · Figure 1a; Figure 2 |
| Base | NaOH solution | mixed with 30% hydrogen peroxide at 3:1 · 2 mM | SI p.6 · Synthesis of chiral CAS-4 thin film · Figure 1a; Figure 2 |
| Oxidant | 30% hydrogen peroxide | NaOH/H2O2 ratio 3:1 · 30% | SI p.6 · Synthesis of chiral CAS-4 thin film · Figure 1a; Figure 2 |
| Solvent | ethanol | wash after each step; substrate stored in ethanol | SI p.6 · Synthesis of chiral CAS-4 thin film · Figure 1a; Figure 2 |