AFM, optical microscopy and HR-TEM
compound 1 delaminated nanosheets on SiO2/Si · Nanosheet
AFM tapping mode on 300 nm SiO2/Si; TEM on TECNAI-F20 at 200 kV.
| Property | Reported value | Normalised value | Uncertainty | Origin and quality | Source |
|---|---|---|---|---|---|
| Tyndall effect after sonication | suspension showed Tyndall effect, confirming delamination | — | — | Qualitative Qualitative | S-8 · Delamination experiments · Figure S10 |
| nanosheet bilayer count | ca. 7 bilayers | — | — | Calculated From Reported Approximate | p006 · Delamination as Nanosheets · Figure S11 |
| nanosheet lateral dimensions | several micrometers | — | — | Text Qualitative | p006 · Delamination as Nanosheets · Figure 8 |
| nanosheet thickness | ca. 7 nm | — | — | Text Approximate | p006 · Delamination as Nanosheets · Figure 8; Figure S11 |